Unraveling the deposition mechanism in a -C:H thin-film growth: A molecular-dynamics study for the reaction behavior of C 3 and C 3H radicals with a -C:H surfaces

Journal of Applied Physics

Volumn 99, Issue 1, 2006, Pages

  Neyts, E ^a   Bogaerts, A ^a   Van De Sanden, M C M ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FLUX RATIO; LINEAR SPECIES; LOW STABILITY;

CROSSLINKING; DEPOSITION; FILM GROWTH; HYDROCARBONS; SURFACE PHENOMENA;

THIN FILMS;

EID: 30944452999     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2150149     Document Type: Article

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