Low temperature diamond growth using halogenated hydrocarbons

Solid State Ionics

Volumn 101-103, Issue PART 1, 1997, Pages 97-101

  Schmidt, I ^a   Hentschel, F ^a   Benndorf, C ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Diamond CVD; Halogenated hydrocarbons; Radical concentration; Raman spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; FILM GROWTH; FLUORINE COMPOUNDS; HYDROCARBONS; LOW TEMPERATURE OPERATIONS; RAMAN SPECTROSCOPY; SUBSTRATES; SURFACE PHENOMENA;

HALOGENATED HYDROCARBONS; RADICAL CONCENTRATION;

DIAMOND FILMS;

EID: 0031273992     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-2738(97)00283-x     Document Type: Article

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