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Volumn 20, Issue 1, 2008, Pages 7-10

Atomic layer deposition - A tool for nanotechnology;Atomlagenabscheidung als Werkzeug für die Nanotechnologie

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; NANOTECHNOLOGY;

EID: 54949084634     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200800339     Document Type: Article
Times cited : (3)

References (18)
  • 1
    • 54949122798 scopus 로고    scopus 로고
    • US Patent 4 058 430 1977
    • US Patent 4 058 430 (1977)
  • 2
    • 0003363794 scopus 로고    scopus 로고
    • Atomic Layer Deposition
    • Film Materials, H.S. Nalwa, Ed, Academic Press, San Diego, Chapter 2, 103-159
    • M. Ritala, M. Leskelä: Atomic Layer Deposition, in Handbook of Thin Film Materials, H.S. Nalwa, Ed., Academic Press, San Diego, 2001, Vol. 1, Chapter 2, 103-159
    • (2001) Handbook of Thin , vol.1
    • Ritala, M.1    Leskelä, M.2
  • 5
    • 21744444606 scopus 로고    scopus 로고
    • R.L. Puurunen, J. of Appl. Physics, 97, (2005), 121301/1-121301/52
    • R.L. Puurunen, J. of Appl. Physics, 97, (2005), 121301/1-121301/52
  • 6
    • 54949130393 scopus 로고    scopus 로고
    • D. Schmidt, S. Strehle, M. Albert, W. Hentsch, J.W. Bartha, Veröffentlichung in Vorbereitung in Microelectronic Engineering
    • D. Schmidt, S. Strehle, M. Albert, W. Hentsch, J.W. Bartha, Veröffentlichung in Vorbereitung in Microelectronic Engineering
  • 12
    • 0034294315 scopus 로고    scopus 로고
    • R. Solanki, B. Pathangey, Electroch. and Solid-State Letters, 3, (2000), 10, 479-480
    • R. Solanki, B. Pathangey, Electroch. and Solid-State Letters, 3, (2000), 10, 479-480


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.