Chemical and optical profiling of ultra thin high-k dielectrics on silicon

Thin Solid Films

Volumn 517, Issue 1, 2008, Pages 459-461

  Bernardini, S ^a   MacKenzie, M ^b   Buiu, O ^c   Bailey, P ^d   Noakes, T C Q ^d   Davey, W M ^c   Hamilton, B ^a   Hall, S ^c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b UNIVERSITY OF GLASGOW   (United Kingdom)

^c UNIVERSITY OF LIVERPOOL   (United Kingdom)

^d DARESBURY LABORATORY   (United Kingdom)

Author keywords

High k; Insulators; Medium Energy Ion scattering; Silicate; Spectroellipsometry; Transmission Electron Microscopy

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPES; HAFNIUM; HAFNIUM COMPOUNDS; HIGH RESOLUTION ELECTRON MICROSCOPY; MICROSCOPIC EXAMINATION; PLASMA INTERACTIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICATES; SILICON; THICK FILMS;

ANALYTICAL TECHNIQUES; COMPLEMENTARY; HAFNIUM SILICATES; HIGH-K; HIGH-K DIELECTRICS; HIGH-RESOLUTION; INSULATORS; MEDIUM ENERGY ION SCATTERING; MEDIUM ENERGY ION SCATTERING SPECTROSCOPIES; OPTICAL PROFILING; SILICATE LAYERS; SPECTROELLIPSOMETRY; THIN-FILMS; TRANSMISSION ELECTRONS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 54849435816     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.048     Document Type: Article

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