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Volumn 26, Issue 1, 2006, Pages 231-234

Understanding and preventing beam damage effects in partially processed high-k gate stacks

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EID: 33644512053     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/26/1/055     Document Type: Conference Paper
Times cited : (2)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.