Compositional analysis of HfxSiyO1-x-y thin films by medium energy ion scattering (MEIS) analysis

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 246-249

  Kitano, H ^a   Abo, S ^a   Mizutani, M ^b   Tsuchimoto, J ^b   Lohner, T ^a   Gyulai, J ^a   Wakaya, F ^a   Takai, M ^a  

^a OSAKA UNIVERSITY   (Japan)

^b RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

Compositional analysis; HfxSiyO1 x y; High k; MEIS; TEA

Indexed keywords

BACKSCATTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCATTERING; SEMICONDUCTING SILICON; SUBSTRATES; THICKNESS MEASUREMENT; THIN FILMS;

COMPOSITIONAL ANALYSIS; HFXSIYO1-X-Y; HIGH-K; MEDIUM ENERGY ION SCATTERING (MEIS); TOROIDAL ELECTROSTATIC ANALYZER (TEA);

HAFNIUM COMPOUNDS;

EID: 33745824249     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.04.007     Document Type: Article

References (8)

1. Van der Veen J.F. Surf. Rep. 5 (1985) 199
2. Smeenk R.G., Tromp R.M., Kersen H.H., Boerboom A.J.H., and Saris F.W. Nucl. Instr. and Meth. 195 (1982) 581
3. Takai M., Taketani M., and Yokoi N. Nucl. Instr. and Meth. 118 (1996) 552
4. Takai M., and Taketani M. Nucl. Instr. and Meth. 136 (1998) 1112
5. Ichihara S., Nakagawa T., Nitta M., Abo S., Tohner T., Angelov C., Ohta K., and Takai M. Nucl. Instr. and Meth. 219 (2004) 584
6. Abo S., Ichihara S., Lohner T., Wakaya F., Eimori T., Inoue Y., and Takai M. Nucl. Instr. and Meth. 237 (2005) 72
7. Kotai E. Nucl. Instr. and Meth. 85 (1994) 588
8. L'Ecuyer J., Davies J.A., and Matsunami N. Nucl. Instr. and Meth. 160 (1979) 337