Influence of top layer geometries on the electronic properties of pentacene and diindenoperylene thin films

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 3, 2008, Pages 578-590

  Scharnberg, M ^a   Adelung, R ^a   Faupel, F ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION PROMOTERS; CONTACT FORMATIONS; EVAPORATION TIMES; GRAIN SIZES; METAL CONTACTS; MODEL SYSTEMS; MOLECULAR ORGANIC THIN FILMS; ORGANIC FIELD EFFECT TRANSISTORS; ORGANIC FILMS; PENTACENE; PREPARATION CONDITIONS; RADIOTRACER TECHNIQUES; SERIES RESISTANCES; TEST STRUCTURES;

ABS RESINS; FIELD EFFECT TRANSISTORS; MODEL STRUCTURES; SEMICONDUCTING ORGANIC COMPOUNDS; THICK FILMS; THIN FILMS;

ELECTRONIC PROPERTIES;

EID: 54849417260     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200723408     Document Type: Article

References (34)

1. J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackay, R. H. Friend, P. L. Burns, and A. B. Holmes, Nature 347, 539 (1990).
2. H. Hoppe and N. S. Sariciftci, J, Mater. Res. 19(7), 1924 (2004).
3. C. Dimitrakopoulos and P. Malenfant, Adv. Mater. 14, 99 (2002).
4. Y. Park, J. Lim, H. Lee, and K. Cho, Mater. Today 10(3), 46 (2007).
5. S. Lee, B. Koo, J.-G. Park, H. Moon, J. Hahn, and J. Kim, MRS Bull. 31, 455 (2006).
6. R. Farchioni and G. Grosso (eds.), Organic Electronic Materials, Part 2: Low Molecular Weight Organic Solids (Springer, Berlin, 2001), chap. 3.
7. Ch. Pannemann, T. Diekmann, and U. Hilleringmann, J. Mater. Res. 19, 1999 (2004).
8. D. Faltermeier, B. Gompf, M. Dressel, A. K. Tripathi, and J. Pflaum, Phys. Rev. B. 74, 125416 (2006).
9. T. Nason, J. Moore, and T. Lu, Appl. Phys. Lett. 60, 1866 (1992).
10. G. Sessler (ed.), Electrets, 2nd ed. (Springer, Berlin, Heidelberg, 1987).
11. D. Gupta and R. Tsui, Appl. Phys. Lett. 17(7), 294 (1970).
12. F. Faupel, A. Thran, V. Zaporojtchenko, T. Strunskus, and M. Kiene, in: Diffusion in Advanced Technological Materials, edited by D. Gupta (Noyes Publication, William Andrew Publishing, 2004).
13. A. Thran, T. Strunskus, V. Zaporojtchenko, and F. Faupel, Appl. Phys. Lett. 81, 244 (2002).
14. H. Gokan, S. Esho, and Y. Ohnishi, J. Electrochem. Soc. 130, 143 (1984).
15. F. Faupel, D. Gupta, B. Silverman, and P. Ho, Appl. Phys. Lett. 55, 357 (1989).
16. F. Faupel, P. Hüppe, K. Rätzke, R. Willecke, and T. Hehenkamp, J. Vac. Sci. Technol. A 10, 92 (1992).
17. A. Thran, M. Kiene, V. Zaporojtchenko, and F. Faupel, MRS Bull. 3 (1999).
18. A. Dürr, F. Schreiber, M. Kelsch, H. Carstanjen, and H. Dosch, Adv. Mater. 14, 961 (2002).
19. F. LeGoues, B. Silverman, and P. Ho, J. Vac. Sci. Technol. A 6, 2200 (1988).
20. F. Faupel R. Willecke, and A. Thran, Mater, Sci. Eng. R 22, 1 (1998),
21. A. Thran, M. Kiene, V. Zaporojtchenko, and F. Faupel, Phys. Rev. Lett. 82, 1903 (1999).
22. S. K. Saha, Phys. Rev. B 69, 125416 (2004).
23. A. Kiesow, J. Morris, C. Radehaus, and A. Heilmann, J. Appl. Phys. 94, 6988 (2003).
24. A. Thran, Diffusion von Gasen und Metallen in Polymeren: Datenanalysen, Experimente und Simulationen, Ph.D. thesis, Christian-Albrechts-Universität zu Kiel (2000).
25. M. Lee and C. Song, Jpn. J. Appl. Phys. 42(7A), 4218 (2003).
26. M. Scharnberg, J. Hu, J. Kanzow, K. Rätzke, R. Adelung, F. Faupel, C. Pannemann, U. Hilleringmann, S, Meyer, and J. Pflaum, Appl. Phys. Lett. 86, 024104 (2005).
27. M. Scharnberg, J. Hu, J. Kanzow, K. Rätzke, R. Adelung, F. Faupel, and J. Pflaum, Defect Diffus Forum 237-240, 993 (2005).
28. M. Scharnberg, J. Kanzow, K. Rätzke, R. Adelung, S. Meyer, J. Pflaum, and F. Faupel, in: Organic Thin-Film Electronics, edited by A. C. Arias, N. Tessler, L. Burgi, and J. A. Emerson, Mater. Res. Soc. Symp. Proc., Vol. 871E (MRS, Warrendale, PA, 2005), p. 16.31.
29. C. Pannemann, T. Diekmann, U. Hilleringmann, U. Schürmann, M. Scharnberg, V. Zaporojtchenko, R. Adelung, and F. Faupel, IEEE Proc. of the IEEE Polytronic 2005 conference, IEEE Catalog No. 05TH8855C (2005), p. 63.
30. C. Pannemann, T. Diekmann, U. Hilleringmann, U, Schürmann, M. Scharnberg, V. Zaporojtchenko, R. Adelung, and F. Faupel, Mater. Sci., in press (2007).
31. M. Scharnberg, V. Zaporojtchenko, R. Adelung, F. Faupel, C. Pannemann, T. Diekmann, and U. Hilleringmann, Appl. Phys. Lett. 90, 013501 (2007).
32. W. A. Lopes, Phys. Rev, E 65, 031606 (2002).
33. S. B. Darling and A. Hoffmann, J. Vac. Sci. Technol. A 25, 1048 (2007).
34. C. Kim, A. Facchetti, and T. J. Marks, Science 318, 76 (2007).