Spectroscopic ellipsometry study of thin diffusion barriers of TaN and Ta for Cu interconnects in integrated circuits

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 4, 2008, Pages 922-926

  Rudra, S R ^a   Wachtler T ^a   Friedrich, M ^a   Louis, S J ^a   Himcinschi, C ^a   Zimmermann, S ^a   Schulz, S E ^a   Silaghi, S ^b   Cobet, C ^b   Esser, N ^b   Gessner, T ^a   Zahn, D R T ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b ISAS INSTITUTE FOR ANALYTICAL SCIENCES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER THINS; BILAYER FILMS; COPPER DIFFUSIONS; CU INTERCONNECTS; DEPOSITION CONDITIONS; DIELECTRIC FUNCTIONS; EFFECTIVE MEDIUM APPROXIMATIONS; ELECTRICAL RESISTIVITIES; ELECTRON MEAN FREE PATHS; ELLIPSOMETRIC MEASUREMENTS; ENERGY RANGES; FILM COMPOSITIONS; FREE CARRIERS; LORENTZ MODELS; NATIVE OXIDE LAYERS; OPTICAL AND ELECTRICAL PROPERTIES; REACTIVE MAGNETRON SPUTTERING; SI (100) SUBSTRATES; SINGLE LAYERS; TANTALUM NITRIDES; UV-VISIBLE;

COPPER; DIFFUSION BARRIERS; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ELLIPSOMETRY; INTEGRATED CIRCUITS; MAGNETIC FILMS; MAGNETRON SPUTTERING; MOLECULAR BEAM EPITAXY; NITRIDES; OPTICAL INTERCONNECTS; OXIDE FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICON; SPECTROSCOPIC ELLIPSOMETRY; TANNING; TANTALUM; TANTALUM COMPOUNDS; THICK FILMS; TRANSITION METALS;

ELECTRIC NETWORK ANALYSIS;

EID: 54849403578     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200777831     Document Type: Article

References (15)

1. A. E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. 30, 363 (2000).
2. A. A. Istratov and E. R. Weber, J. Electrochem. Soc. 149, G21 (2002).
3. Y. Wang, C. Zhu, Z. Song, and Y. Li, Microelectron. Eng. 71, 69 (2004).
4. H. C. Kim and T. L. Alford, Thin Solid Films 449, 6 (2004).
5. W. F. Wu, K.-L. Ou, C. P. Chou, and C. C. Wu, J. Electro-chem. Soc. 150, G83 (2003).
6. D. Edelstein et al., Proc. IITC, San Francisco, June 2001, p. 9.
7. S. M. Aouadi, P. K. Shreeman, and M. Williams, J. Appl. Phys. 96, 3955 (2004).
8. E. Langereis, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 100, 023534 (2006).
9. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).
10. F. Wooten, Optical Properties of Solids (Academic, New York, 1972).
11. N. W. Ashcroft and N. D. Mermin, Solid State Physics (Saunders College, Orlando, 1976), pp. 2-15.
12. E. D. Palik, Handbook of optical constants of solids II (Academic Press, 1998), pp. 408-417C.
13. H. Landolt and R. Börnstein, Physikalisch-Chemische Tabellen (Springer, Berlin, 1923), p. 220.
14. Stampfl and A.J. Freeman, Phys. Rev. B 71, 024111 (2005).
15. E. Langereis et al., J. App. Phys. 102, 083517 (2007).