X-ray study of the surface morphology of crystalline and amorphous tantalum peroxide thin films prepared by RF magnetron sputtering

Journal of Crystal Growth

Volumn 237-239, Issue 1 4 I, 2002, Pages 492-495

  Huang, Tzu Wen ^a   Lee, Hsin Yi ^b   Hsieh, Yung Wei ^b   Lee, Chih Hao ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

A1. Growth model; A1. X ray reflectivity; A3. Polycrystalline deposition; B1. Tantalum oxide

Indexed keywords

AMORPHOUS FILMS; COALESCENCE; CRYSTAL GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; NUCLEATION; POLYCRYSTALLINE MATERIALS; REFLECTION; SURFACE ROUGHNESS; TITANIUM COMPOUNDS; X RAYS;

POLYCRYSTALLINE DEPOSITION; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 0036531450     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01950-9     Document Type: Article

References (13)