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Volumn 51, Issue 10, 2004, Pages 1704-1710

Hot hole degradation effects in lateral nDMOS transistors

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC BREAKDOWN; ELECTRIC CURRENTS; ELECTRON TRAPS; HOT CARRIERS; IMPACT IONIZATION; INTEGRATED CIRCUIT LAYOUT; MATHEMATICAL MODELS;

EID: 5444222133     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.834913     Document Type: Article
Times cited : (69)

References (12)
  • 1
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    • Hot-carrier reliability in submicron LDMOS transistors
    • R. Versari et al., "Hot-carrier reliability in submicron LDMOS transistors," in IEDM Tech. Dig., 1997, pp. 371-374.
    • (1997) IEDM Tech. Dig. , pp. 371-374
    • Versari, R.1
  • 3
    • 0032665190 scopus 로고    scopus 로고
    • Experimental study of hot-carrier effects in LDMOS transistors
    • Oct
    • R. Versari and A. Pieracci, "Experimental study of hot-carrier effects in LDMOS transistors," IEEE Trans. Electron Devices, vol. 46, pp. 1228-1233, Oct. 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , pp. 1228-1233
    • Versari, R.1    Pieracci, A.2
  • 4
    • 0035715847 scopus 로고    scopus 로고
    • A novel hot hole injection degradation model for lateral DMOS transistors
    • P. Moens et al., "A novel hot hole injection degradation model for lateral DMOS transistors," in IEDM Tech. Dig., 2001, pp. 877-880.
    • (2001) IEDM Tech. Dig. , pp. 877-880
    • Moens, P.1
  • 5
    • 0042941432 scopus 로고    scopus 로고
    • A unified hot carrier degradation model for integrated lateral and vertical nDMOS transistors
    • P. Moens et al., "A unified hot carrier degradation model for integrated lateral and vertical nDMOS transistors," in Proc. Int. Symp. Power Semiconductor Devices, 2003, pp. 88-91.
    • (2003) Proc. Int. Symp. Power Semiconductor Devices , pp. 88-91
    • Moens, P.1
  • 6
    • 0038649168 scopus 로고    scopus 로고
    • Competing hot carrier degradation mechanisms in lateral n-type DMOS transistors
    • P. Moens et al., "Competing hot carrier degradation mechanisms in lateral n-type DMOS transistors," in Proc. Int. Reliability Physics Symp., 2003, pp. 214-221.
    • (2003) Proc. Int. Reliability Physics Symp. , pp. 214-221
    • Moens, P.1
  • 7
    • 1642634448 scopus 로고    scopus 로고
    • Nature location of interface traps in RF LDMOS due to hot carriers
    • T. Nigam et al., "Nature and location of interface traps in RF LDMOS due to hot carriers," Microelectron. Eng., vol. 72, pp. 71-75, 2004.
    • (2004) Microelectron. Eng. , vol.72 , pp. 71-75
    • Nigam, T.1
  • 8
    • 84945713471 scopus 로고
    • Hot-electron induced MOSFET degradation - model monitor improvement IEEE
    • T. Hu et al., "Hot-electron induced MOSFET degradation - model, monitor and improvement," IEEE Trans. Electron Devices, vol. ED-32, pp. 375-381, 1985.
    • (1985) Trans. Electron Devices , vol.ED-32 , pp. 375-381
    • Hu, T.1
  • 9
    • 0024705114 scopus 로고
    • Analysis of the charge pumping technique its applications for the evaluation of MOSFET degradation
    • P. Heremans et al., "Analysis of the charge pumping technique and its applications for the evaluation of MOSFET degradation," IEEE Trans. Electron Devices, vol. 36, pp. 1318-1335, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 1318-1335
    • Heremans, P.1
  • 11
    • 0028257774 scopus 로고
    • Physical analysis for saturation behavior of hot-carrier degradation in lightly doped drain n-channel MOSFETs
    • J. S. Goo et al., "Physical analysis for saturation behavior of hot-carrier degradation in lightly doped drain n-channel MOSFETs," J. Appl. Phys, vol. 33, pp. 606-611, 1994.
    • (1994) J. Appl. Phys , vol.33 , pp. 606-611
    • Goo, J.S.1
  • 12
    • 0035278429 scopus 로고    scopus 로고
    • A new degradation model lifetime extrapolation technique for LDD nMOSFETs under hot-carrier degradation
    • R. Dreesen et al., "A new degradation model and lifetime extrapolation technique for LDD nMOSFETs under hot-carrier degradation," Microelectron. Reliab., vol. 41, pp. 437-443, 2001.
    • (2001) Microelectron. Reliab. , vol.41 , pp. 437-443
    • Dreesen, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.