In situ micro-Raman analysis and X-ray diffraction of nickel silicide thin films on silicon

Micron

Volumn 40, Issue 1, 2009, Pages 89-93

  Bhaskaran, M ^a   Sriram, S ^a   Perova, T S ^b   Ermakov, V ^b   Thorogood, G J ^c   Short, K T ^c   Holland, A S ^a  

^a RMIT UNIVERSITY   (Australia)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

In situ measurements; Micro Raman spectroscopy; Nickel silicide; XRD

Indexed keywords

ANNEALING; BIOLOGICAL ORGANS; DIFFRACTION; METAL ANALYSIS; NICKEL; NICKEL ALLOYS; NONMETALS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; RAPID SOLIDIFICATION; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; SOLIDS; SPECTRUM ANALYSIS; SUBSTRATES; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

IN SITU MEASUREMENTS; IN SITU STUDIES; IN-SITU; IN-SITU ANALYSIS; INTERMEDIATE REACTIONS; METALLIC STATES; MICRO-RAMAN SPECTROSCOPY; NICKEL FILMS; NICKEL SILICIDE; NICKEL SILICIDE THIN FILMS; NICKEL SILICIDES; NICKEL THIN FILMS; POINTS OF INTERESTS; RAMAN ANALYSIS; REACTION PRODUCTS; ROOM TEMPERATURES; SILICON SUBSTRATES; TEMPERATURE INTERVALS; THERMAL PROCESSING; VACUUM-ANNEALING; X-RAY DIFFRACTIONS; XRD;

IN SITU PROCESSING;

EID: 54349120834     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2008.03.007     Document Type: Article

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