Reduction of sheet resistance and low-thermal-budget relaxation of stress gradients in polysilicon microcantilever beams using nickel-silicides

Journal of Microelectromechanical Systems

Volumn 16, Issue 2, 2007, Pages 279-288

  Kang, Tae June ^a   Lee, Ho Young ^a   Kim, Yong Hyup ^a  

^a Seoul National University   (South Korea)

Author keywords

Cathodic protection; Nickel silicide; Sheet resistance; Stress gradient

Indexed keywords

CANTILEVER BEAMS; CATHODIC PROTECTION; COMPRESSIVE STRESS; CORROSION RESISTANCE; MICROMACHINING; NANOCANTILEVERS; NICKEL COMPOUNDS; POLYSILICON; RESIDUAL STRESSES; SHEET RESISTANCE; STRESS RELAXATION; TENSILE STRESS;

MICROCANTILEVER BEAMS; NICKEL-SILICIDES; STRESS GRADIENT;

MEMS;

EID: 34147177112     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2007.892898     Document Type: Article

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