Characterisation of nickel silicide thin films by spectroscopy and microscopy techniques

Micron

Volumn 40, Issue 1, 2009, Pages 99-103

  Bhaskaran, M ^a   Sriram, S ^a   Holland, A S ^a   Evans, P J ^b  

^a RMIT UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

Kikuchi patterns; Microscopy; Nickel silicide; Spectroscopy

Indexed keywords

BACKSCATTERING; CONTAMINATION; ELECTRON BEAMS; ELECTRONS; FILMS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; MICROSCOPIC EXAMINATION; NICKEL; NICKEL ALLOYS; NONMETALS; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; SOLIDS; SURFACE ROUGHNESS; SURFACES; THICK FILMS; THIN FILMS;

AES DEPTH PROFILES; ATOMIC FORCES; AUGER ELECTRON SPECTROSCOPY DEPTH PROFILES; AVERAGE GRAIN SIZES; AVERAGE SURFACE ROUGHNESSES; CHARACTERISATION; EXPERIMENTAL DATUM; FILM SURFACES; KIKUCHI PATTERNS; MATERIALS CHARACTERISATION; MICROSCOPY; MICROSCOPY TECHNIQUES; NICKEL SILICIDE; NICKEL SILICIDE THIN FILMS; NICKEL SILICIDES; NISI FILMS; OXYGEN CONTAMINATIONS; RUTHERFORD BACKSCATTERINGS; SECONDARY IONS; SILICON INTERFACES; SIMS DEPTH PROFILES; UNIFORM FILMS;

AUGER ELECTRON SPECTROSCOPY;

EID: 54349112847     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2007.12.008     Document Type: Article

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