Surface characterisation of silicon substrates seeded with diamond nanoparticles under UHV annealing

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 9, 2008, Pages 2108-2113

  Arnault, J C ^a   Saada, S ^a   Williams, O A ^b,c   Haenen, K ^b,c   Bergonzo, P ^a   Nesladek, M ^a   Polini, R ^d   Osawa, E ^e  

^a DIF   (France)

^b HASSELT UNIVERSITY   (Belgium)

^c IMEC   (Belgium)

^d UNIVERSITY OF ROME TOR VERGATA   (Italy)

^e SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING STATES; CHARACTERISATION; DIAMOND NANOPARTICLES; FEG-SEM; GROWTH STEPS; HIGH VACUUMS; SILICON SUBSTRATES; SILICON SURFACES; THERMAL STABILITIES; UHV ANNEALING;

DIAMONDS; SILICON; SILICON CARBIDE; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING;

EID: 54249152384     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200879728     Document Type: Conference Paper

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