Diamond nanoseeding on silicon: Stability under H2 MPCVD exposures and early stages of growth

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1143-1149

  Arnault, J C ^a   Saada, S ^b   Nesladek, M ^b,c   Williams, O A ^c   Haenen, K ^c   Bergonzo, P ^b   Osawa, E ^d  

^a DIF   (France)

^b CEA SACLAY   (France)

^c HASSELT UNIVERSITY   (Belgium)

^d SHINSHU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Etching; Nanoparticles; Surface characterization

Indexed keywords

DIAMONDS; SILICON;

CHEMICAL VAPOR DEPOSITION; ETCHING; NANO DIAMONDS; NANOPARTICLES; SILICON SURFACES; SURFACE CHARACTERIZATION;

NONMETALS;

EID: 48849109289     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.008     Document Type: Article

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