Preparation of MgO films by atmospheric metal-organic chemical vapor deposition as a protective layer in AC plasma display panels

Japanese Journal of Applied Physics

Volumn 47, Issue 3 PART 1, 2008, Pages 1699-1705

  Okada, Takeru ^a   Komaki, Toshihiro ^a  

^a PIONEER CORPORATION   (Japan)

Author keywords

AC plasma display panels; Atmospheric MOCVD; Discharge delay; MgO; Protective layer; SEM; TG DTA; XRD

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERICS; CRYSTAL IMPURITIES; DEPOSITION; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; FILM GROWTH; FILM PREPARATION; INDUSTRIAL CHEMICALS; MAGNESIUM PRINTING PLATES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; PLASMA DEPOSITION; PLASMAS; THEOREM PROVING; THICK FILMS; VACUUM DEPOSITION; VAPORS;

AC PLASMA DISPLAY PANELS; ATMOSPHERIC MOCVD; DISCHARGE DELAY; MGO; PROTECTIVE LAYER; SEM; TG-DTA; XRD;

PLASMA DISPLAY DEVICES;

EID: 54249146192     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.1699     Document Type: Article

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