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Volumn 105, Issue 7, 1997, Pages 551-554

Preferential orientation of titanium dioxide polycrystalline films using atmospheric CVD technique

Author keywords

Atmospheric CVD; Columnar crystals; Growth kinetics; Growth mechanism; PBC; Preferential orientation; Rapid deposition; Titanium dioxide polycrystalline films

Indexed keywords

CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; FILM GROWTH; X RAY DIFFRACTION ANALYSIS;

EID: 0031188518     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.105.551     Document Type: Article
Times cited : (34)

References (9)
  • 8
    • 0004147868 scopus 로고
    • North-Holland, London, U. K.
    • P. Hartman, "Crystal Growth," North-Holland, London, U. K. (1973).
    • (1973) Crystal Growth
    • Hartman, P.1
  • 9
    • 85039807032 scopus 로고    scopus 로고
    • The Amer. Nuclear Soc., Hinsdale. III
    • W. R. Holman and F. J. Huegel, "CVD I", The Amer. Nuclear Soc., Hinsdale. III, p. 127.
    • CVD I , pp. 127
    • Holman, W.R.1    Huegel, F.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.