Mechanism underlying damage induced in gallium nitride epilayer during laser lift-off process

Japanese Journal of Applied Physics

Volumn 47, Issue 2 PART 1, 2008, Pages 930-932

  Lee, Ko Tao ^a   Lee, Yeeu Chang ^b   Tu, Sheng Han ^a   Lin, Ching Liang ^a   Chen, Po Hen ^a   Liu, Cheng Yi ^a   Chang, Jeng Yang ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

Damage; LED; LLO; Thermal gradient

Indexed keywords

ABERRATIONS; GALLIUM ALLOYS; GALLIUM COMPOUNDS; GALLIUM NITRIDE; LASERS; LIGHT EMITTING DIODES; NITRIDES; OPTICAL PROPERTIES; SEMICONDUCTING GALLIUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THERMAL GRADIENTS; THERMOANALYSIS;

BLUE LIGHT; DAMAGE; LLO; PULSE LASERS; VERTICAL-TYPE;

PULSED LASER APPLICATIONS;

EID: 54249110443     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.930     Document Type: Article

References (8)

1. J. T. Chu, H. W. Huang, C. C. Kao, W. D. Liang, F. I. Lai, C. F. Chu, H. C. Kuo, and S. C. Wang: Jpn. J. Appl. Phys. 44 (2005) 2509.
2. W. S. Wong, T. Sands, N. W. Cheung, M. Kneissi, D. P. Bour, P. Mei, L. T. Romano, and N. M. Johnson: Appl. Phys. Lett. 75 (1999) 1360.
3. W. S. Wong, T. Sands, N. M. Cheung, M. Kneissi, D. P. Bour, P. Mei, L. T. Romano, and N. M. Johnson: Appl. Phys. Lett. 77 (2000) 2822.
4. C. F. Chu, F. I. Lai, J. T. Chu, C. C. Yu, C. F. Lin, H. C. Kuo, and S. C. Wang: J. Appl. Phys. 95 (2004) 3916.
5. M. K. Kelly, O. Ambacher, R. Dimitrov, R. Handschuh, and M. Stutzmann: Phys. Status Solidi A 159 (1997) R3.
6. R. W. Martin, H. S. Kim, Y. Cho, P. R. Edwards, I. M. Watson, T. Sands, N. W. Cheung, and M. D. Dawson: Mater. Sci. Eng. B 93 (2002) 98.
7. H. J. Chang, C. H. Chen, L. Y. Huang, Y. F. Chen, and T. Y. Lin: Appl. Phys. Lett. 86 (2005) 011924.
8. S. Lugomer: Laser Technology: Laser Driven Processes (Prentice-Hall, Upper Saddle River, NJ, 1990) p. 74.