Structural characterization of AlGaN/AlN Bragg reflector grown by metalorganic chemical vapor deposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 205, Issue 7, 2008, Pages 1572-1574

  Ji, X L ^a   Jiang, R L ^a   Liu, B ^a   Xie, Z L ^a   Zhou, J J ^a   Li, L ^a   Han, P ^a   Zhang, R ^a   Zheng, Y D ^a   Zheng, J G ^b  

^a NANJING UNIVERSITY   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A CENTERS; AL COMPOSITIONS; ENERGY DISPERSIVE; FREE OF CRACKS; METALORGANIC CHEMICAL VAPOR DEPOSITIONS; OPTICAL MICROSCOPES; PEAK REFLECTIVITIES; REFLECTANCE SPECTRUMS; SAPPHIRE SUBSTRATES; SCANNING TRANSMISSION ELECTRON MICROSCOPES; STRUCTURAL CHARACTERIZATIONS; X-RAY FLUORESCENCES;

AUGER ELECTRON SPECTROSCOPY; BRAGG CELLS; BRAGG REFLECTORS; CORUNDUM; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; MICROSCOPES; SEMICONDUCTING ALUMINUM COMPOUNDS; SPECTROMETERS; TELECOMMUNICATION SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY; VAPORS;

REFLECTION;

EID: 54249089832     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200723051     Document Type: Article

References (19)

1. M. Asif Khan, J. N. Kuznia, J. M. Van Hove, and D. T. Ol-son, Appl. Phys. Lett. 59, 1449 (1991).
2. H. M. Ng, T. D. Moustakas, and S. N. G. Chu, Appl. Phys. Lett. 76, 2818 (2000).
3. K. E. Waldrip, J. Han, J. J. Figiel, H. Zhou, E. Makarona, and A. V. Nurmikko, Appl. Phys. Lett. 78, 3205 (2001).
4. J.-F. Carlin, C. Zellweger, J. Dorsaz, S. Nicolay, G. Christmann, E. Feltin, R. Butté, and N. Grandjean, phys. stat. sol. (b) 242, 2326 (2005).
5. G. Kipshidze, V. Kuryatkov, K. Choi, lu. Gherasoiu, B. Borisov, S. Nikishin, M. Holtz, D. Tsvetkov, V. Dmitriev, and H. Temkin, phys. stat. sol. (a) 188, 881 (2001).
6. F. Semond, N. Antoine-Vincent, N. Schnell, G. Malpuech, M. Leroux, J. Massies, P. Disseix, J. Leymarie, and A. Vasson, phys. stat. sol. (a) 183, 163 (2001).
7. F. Fedler, H. Klausing, R. J. Hauenstein A. Ponce, S. I. Molina, O. Semchinova, J. Aderhold, and J. Graul, phys. stat. sol. (c) 0, 258 (2002).
8. H. Klausing, F. Fedler, J. Dänhardt, R. Jaurich, A. Kariazine, S. Günster, D. Mistele, and J. Graul, phys. stat. sol. (a), 194, 428 (2002).
9. T. Wang, R. J. Lynch, P. J. Parbrook, R. Butté, A. Alyamani, D. Sanvitto, D. M. Whittaker, and M. S. Skolnick, Appl. Phys. Lett. 85, 43 (2004).
10. O. Mitrofanov, S. Schmult, M. J. Mantra, T. Siegrist, N. G. Weimann, A. M. Sergent, and R. J. Molnar, Appl. Phys. Lett. 88, 171101 (2006).
11. E. Feltin, J.-F. Carlin, J. Dorsaz, G. Christmann, R. Butté, M. Laügt, M. Llegems, and N. Grandjean, Appl. Phys. Lett. 88, 051108 (2006).
12. C. G. Moe, Yuan Wu, J. Piprek, S. Keller, J. S. Speck, S. P. DenBaars, and D. Emerson, phys. stat. sol. (a) 203, 1915 (2006).
13. H. Amano, N. Sawaki, I. Akasaki, and Y. Toyoda, Appl. Phys. Lett. 48, 353 (1986).
14. X. L. Ji, R. L. Jiang, Z. L. Xie, B. Liu, J. J. Zhou, L. Li, P. Han, R. Zhang, Y. D. Zheng, and H. M. Gong, Chin. Phys. Lett. 24(6), 1735 (2007).
15. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Po-larized Light (North Holland Publishing Company, Amster-dam, 1977).
16. D. Brunner, H. Angerer, E. Bustarret, F. Freudenberg, R. Höpler, R. Dimitrov, O. Ambacher, and M. Stutzmann, J. Appl. Phys. 82, 5090 (1997).
17. Yu-Li Tsai, Cheng-Liang Wang, Po-Hung Lin, Wei-Tsai Liao, and Jyh-Rong Gong, Appl. Phys. Lett. 82, 31 (2003).
18. Sung Chul Choi, Jong-Hee Kim, Ji Youn Choi, Kang Jae Lee, Kee Young Lim, and Gye Mo Yang, J. Appl. Phys. 87, 172 (2000).
19. Tomoe Shirasawa, Noriaki Mochida, Akira Inoue, Tohru Honda, Takahiro Sakaguchi, Fumio Koyama, and Kenichi Iga, J. Cryst. Growth 189, 124 (1998).