Optical thin films of silica and titania deposited by plasma polymerisation process: System design and fabrication

Indian Journal of Engineering and Materials Sciences

Volumn 15, Issue 3, 2008, Pages 265-274

  Srivatsa, K M K ^a   Bera, Mrinmoyee ^a   Basu, A ^a   Bhattacharya, T K ^a  

^a NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Optical thin film; Plasma polymerization; Precursor; Silica; Titania

Indexed keywords

DEPOSITION PROCESS; DEPOSITION SYSTEMS; EXTINCTION COEFFICIENTS; MULTI-LAYER-COATING; OPTICAL THIN FILMS; PRECURSOR; TITANIA; TITANIUM TETRACHLORIDES;

DIELECTRIC FILMS; METALLIC FILMS; OPTICAL MULTILAYERS; PLASMA POLYMERIZATION; REFRACTIVE INDEX; SILICA; THIN FILMS; TITANIUM DIOXIDE;

DEPOSITION;

EID: 54249084096     PISSN: 09714588     EISSN: 09751017     Source Type: Journal    
DOI: None     Document Type: Article

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