Phase composition of 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 film deposited by radio frequency magnetron sputtering

Journal of Materials Processing Technology

Volumn 209, Issue 1, 2009, Pages 343-347

  Wang, J M ^a   Li, W L ^a   Fei, W D ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Perovskite phase; PMN PT; processing gas; Radio frequency magnetron sputtering

Indexed keywords

LEAD ALLOYS; MAGNESIUM PRINTING PLATES;

PEROVSKITE PHASE; PMN-PT; PROCESSING GAS; RADIO-FREQUENCY-MAGNETRON SPUTTERING;

LEAD;

EID: 53949086276     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.02.003     Document Type: Article

References (18)

1. 3 thin films grown by pulsed laser deposition. J. Appl. Phys. 93 (2003) 9924-9929
2. Fribourg-Blanc E., Defay E., Cattan E., and Remiens D. Electrical characterization of PMNT films. Integr. Ferroelectr. 55 (2003) 853-862
3. 3 thin films using seeding layer. J. Am. Ceram. Soc. 87 (2004) 1031-1034
4. 3 perovskite electrode. Jpn. J. Appl. Phys. 11A 43 (2004) 7600-7603
5. Hoffman D.W., and Thornton J.A. Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source. J. Vac. Sci. Technol. 20 (1982) 355-358
6. x thin films without seeding layers. J. Am. Ceram. Soc. 85 (2002) 1867-1869
7. Kreisel J., Dkhil B., and Kiat J.M. Effect of high pressure on relaxor ferroelectrics. Phys. Rev. B 65 (2002) 172101 (1-4)
8. 3 thin films. Mater. Sci. Eng. B 106 (2004) 111-119
9. 3 (90/10) thin films. J. Vac. Sci. Technol. A 18 (2000) 1659-1662
10. 3 thin films using solid source MOCVD techniques. J. Cryst. Growth 226 (2001) 247-253
11. 3 thin film heterostructures deposited by pulsed laser ablation. Appl. Phys. A: Mater. 70 (2000) 269-274
12. 3 thin films derived from RF magnetron sputtering. Ceram. INT 30 (2004) 1539-1542
13. Nagarajan V., Alpay S.P., and Ramesh R. Role of substrate on the dielectric and piezoelectric behavior of epitaxial lead magnesium niobate-lead titanate relaxor thin films. Appl. Phys. Lett. 77 (2000) 438-440
14. Takeshima Y., Shiratsuyu K., Takagi H., and Tomono K. Preparation of lead magnesium niobate titanate thin films by chemical vapor deposition. Jpn. J. Appl. Phys. Part 1 34 (1995) 5083-5085
15. Thornton J.A., and Hoffman D.W. The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources. J. Vac. Sci. Technol. A3 (1985) 576-579
16. Zhang Q.M., and Zhao J. Polarization responses in lead magnesium niobate based relaxor ferroelectrics. Appl. Phys. Lett. 71 (1997) 1649-1651
17. Zhao J., Zhang Q.M., Kim N., and Shrout T. Electromechanical properties of relaxor ferroelectric lead magnesium niobate-lead titanate ceramics. Jpn. J. Appl. Phys. Part 1 34 (1995) 5658-5663
18. 3, thin films. J. Am. Ceram. Soc. 85 (2002) 1997-2000