Dry tin dioxide hollow microshells and extreme ultraviolet radiation induced by CO2 laser illumination

Langmuir

Volumn 24, Issue 18, 2008, Pages 10402-10406

  Ge, Liqin ^a,b   Nagai, Keiji ^a   Gu, ZhongZe ^b   Shimada, Yoshinori ^a   Nishimura, Hiroaki ^a   Miyanaga, Noriaki ^a   Izawa, Yasukazu ^a   Mima, Kunioki ^a   Norimatsu, Takayoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

TIN; TITANIUM COMPOUNDS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET RADIATION; MICROSHELLS;

TIN DIOXIDE;

CARBON DIOXIDE; ELECTROLYTE; MICROSPHERE; NANOPARTICLE; TIN; TIN DERIVATIVE; TIN DIOXIDE;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; HEAT; LASER; SCANNING ELECTRON MICROSCOPY; STATISTICAL MODEL; SURFACE PROPERTY; ULTRAVIOLET RADIATION; X RAY DIFFRACTION;

ADSORPTION; CARBON DIOXIDE; ELECTROLYTES; HEAT; LASERS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; MICROSPHERES; MODELS, STATISTICAL; NANOPARTICLES; SURFACE PROPERTIES; TIN; TIN COMPOUNDS; ULTRAVIOLET RAYS; X-RAY DIFFRACTION;

EID: 52649130772     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la800766q     Document Type: Article

References (32)

1. Bakshi, V. Ed. EUV source for lithography; SPIE Press: Bellingham, WA, 2006.
2. Shimada, Y.; Nishimura, H.; Nakai, M.; Hashimoto, K.; Yamaura, M.; Tao, Y.; Shigemori, K.; Okuno, T.; Nishihara, K.; Kawamura, T.; Sunahara, A.; Nishikawa, T.; Sasaki, A.; Nagai, K.; Norimatsu, T.; Fujioka, S.; Uchida, S.; Miyanaga, N.; Izawa, Y.; Yamanaka, C. Appl. Phys. Lett. 2005, 86, 051501.
3. (a) Gu, Q. C.; Nagai, K.; Norimatsu, T.; Fujioka, S.; Nishimura, H.; Nishihara, K.; Miyanaga, N.; Izawa, Y. Chem. Mater. 2005, 17, 1115-1122.
4. (b) Okuno, T.; Fujioka, S.; Nishimura, H.; Tao, Y.; Nagai, K.; Gu, Q.; Ueda, N.; Ando, T.; Nishihara, K.; Norimatsu, T.; Miyanaga, N.; Izawa, Y.; Mima, K.; Sunahara, A.; Furukawa, H.; Sasaki, A. Appl. Phys. Lett. 2006, 88, 161501.
5. (c) Nagai, K.; Gu, Q. C.; Gu, Z. Z.; Okuno, T.; Fujioka, S.; Nishimura, H.; Tao, Y. Z.; Yasuda, Y.; Nakai, M.; Norimatsu, T.; Shimada, Y.; Yamaura, M.; Yoshida, H.; Nakatsuka, M.; Miyanaga, N.; Nishihara, K.; Izawa, Y. Appl. Phys. Lett. 2006, 88, 094102.
6. (d) Pan, C.; Gu, Z. Z.; Nagai, K.; Norimatsu, T.; Birou, T.; Hashimoto, K.; Shimada, Y. J. Appl. Phys. 2006, 100, 016104.
7. (e) Nagai, K.; Wada, D.; Nakai, M.; Norimatsu, T. Fusion Sci. Technol. 2006, 49, 686-690.
8. (a) Fujioka, S.; Nishimura, H.; Nishihara, K.; Murakami, M.; Kang, Y.-G.; Gu, Q. C.; Nagai, K.; Norimatsu, T.; Miyanaga, N.; Izawa, Y.; Mima, K.; Shimada, Y.; Sunahara, A.; Furukawa, H. Appl. Phys. Lett. 2005, 87, 241503.
9. (b) Namba, S.; Fujioka, S.; Nishimura, H.; Yasuda, Y.; Nagai, K.; Miyanaga, N.; Izawa, Y.; Mima, K.; Takiyama, K. Appl. Phys. Lett. 2006, 88, 171503.
10. The specification of the EUV source is described in ref 1. The estimation of the minimum mass of tin was based on the experiments, for example, as shown in ref 4. More information about low density tin for EUV light is described in the following: Nanomaterials to generate extreme ultraviolet (EUV) light. In Encyclopedia of Nanoscience and Nanotechnology, 2nd ed.; Nalwa, E. H., Ed.; American Science Publishers: Stevenson Ranch, CA, 2008; in press.
11. (a) Decher, G. Science 1997, 277, 1232-1237.
12. (b) Lvov, Y.; Ariga, K.; Ichinose, I.; Kunitake, T. J. Am. Chem. Soc. 1995, 117, 6117-6123.
13. Caruso, F.; Caruso, R.; Möhwald, H. Science 1998, 282, 1111-1114.
14. (a) Donath, E.; Sukhorukov, G. B.; Caruso, F.; Davis, S. A.; Möhwald, H. Angew. Chem., Int. Ed. 1998, 37, 2202-2205.
15. (b) Radziuk, D.; Shchukin, D. G.; Skirtach, A.; Möhwald, H.; Sukhorukov, G. Langmuir 2007, 23, 4612-4647.
16. (c) Gao, C. Y.; Leporatti, S.; Moya, S.; Donath, E.; Möhwald, H. Langmuir 2001, 17, 3491-3495.
17. (d) Köhler, K.; Shchukin, D. G.; Möhwald, H.; Sukhorukov, G. B. J. Phys. Chem. B 2005, 109, 18250-18259.
18. (a) Radziuk, D.; Shchukin, D. G.; Skirtach, A.; Möhwald, H.; Sukhorukov, G. Langmuir 2007, 23, 4612-4617.
19. (b) Lee, D.; Rubner, M. F.; Cohen, R. E. Chem. Mater. 2005, 17, 1099-1105.
20. Koo, H. Y.; Chang, S. T.; Choi, W. S.; Park, J.-H.; Kim, D.-Y.; Velev, O. D. Chem. Mater. 2006, 18, 3308-3313.
21. (a) Zhu, H.; Stein, E. W.; Lu, Z.; Lvov, Y. M.; McShane, M. Chem. Mater. 2005, 17, 2323-2328.
22. (b) Ge, L. Q.; Möhwald, H.; Li, J. B. Chem.-Eur. J. 2003, 9, 2589-2594.
23. (c) Ge, L. Q.; Möhwald, H.; Li, J. B. ChemPhysChem 2003, 4, 1351-1355.
24. Andreava, D. V.; Gorin, D. A.; Möhwald, H.; Sukhoroukov, G. B. Langmuir 2007, 23, 9031-9036.
25. Koehler, K.; Shchukin, D. G.; Sukhorukov, G. B.; Möhwald, H. Macromolecules 2004, 37, 9546-9550.
26. Gao, C.; Leporatti, S.; Donath, E.; Möhwald, H. J. Phys. Chem. B 2000, 104, 7144-7149.
27. Extreme ultraviolet light source. JP Patent 297737, 2003.
28. Laser plasma X-ray sources and semiconductor exposure apparatus. JP Patent 345698, 1999.
29. X-ray generation method, X-ray generator. JP Patent 85940, 2006.
30. Higashiguchi, T.; Hamada, M.; Kubodera, S. Rev. Sci. Instrum. 2007, 78, 036106.
31. Tanaka, H.; Matsumoto, A.; Akinaga, K.; Takahashi, A.; Okada, T. Appl. Phys. Lett. 2005, 87, 041503.
32. Ueno, Y.; Soumagne, G.; Sumitani, A.; Endo, A.; Higashiguchi, T. Appl. Phys. Lett. 2007, 91, 231501.