Modulated photothermal reflectance technique for measuring thermal conductivity of nano film on substrate and thermal boundary resistance

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8359-8362

  Bu, W F ^a   Tang, D W ^a   Wang, Z L ^a   Zheng, X H ^a   Cheng, G H ^b  

^a INSTITUTE OF ENGINEERING THERMOPHYSICS   (China)

^b XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS   (China)

Author keywords

Interface thermal resistance; Nano film; Photothermal reflectance technique; Silicon dioxide; Simulation Annealing Algorithm; Thermal boundary resistance; Thermal conductivity; Thin films

Indexed keywords

CARBON FIBER REINFORCED PLASTICS; SILICON COMPOUNDS; THERMAL CONDUCTIVITY; THERMAL INSULATING MATERIALS; THERMODYNAMIC PROPERTIES; THERMOELECTRICITY;

INTERFACE THERMAL RESISTANCE; NANO FILM; PHOTOTHERMAL REFLECTANCE TECHNIQUE; SILICON DIOXIDE; SIMULATION ANNEALING ALGORITHM; THERMAL BOUNDARY RESISTANCE; THIN FILMS;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 51049117015     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.037     Document Type: Article

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