Crystal phase transition of HfO2 films evaporated by plasma-ion-assisted deposition

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Wang, Jue ^a   Maier, Robert L ^a   Schreiber, Horst ^a  

^a Corning Tropel Corporation ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; DEPOSITION; HAFNIUM OXIDES; ION BEAM ASSISTED DEPOSITION; IONS; MOMENTUM; MOMENTUM TRANSFER; OPTICAL CORRELATION; OPTICAL PROPERTIES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; SURFACE ROUGHNESS; X RAY DIFFRACTION;

CRYSTAL PHASE TRANSITION; FUNDAMENTAL ABSORPTION EDGE; HIGH-REFRACTIVE-INDEX MATERIALS; OPTICAL INTERFERENCE COATINGS; PLASMA ION ASSISTED DEPOSITION; STRUCTURAL EVOLUTION; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY; X-RAY DIFFRACTION MEASUREMENTS;

OPTICAL FILMS;

EID: 50849122714     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C189     Document Type: Article

References (10)

1. 2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition," Thin Solid Films 410, 86-93 (2002).
2. A. Rizzo, M. Alvisi, F. Sarto, S. Scaglione, and L. Vasanelli, "The influence of ion mass and energy on the composition of IBAD oxide films," Surf. Coat. Technol. 108-109, 297-302 (1998).
3. M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, "Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance," Thin Solid Films 354, 19-23 (1999).
4. T. R. Jensen, J. Warren, and R. L. Johnson, Jr., "Ion-assisted deposition of moisture-stable hafnium oxide films for ultraviolet applications," Appl. Opt. 41, 3205-3210 (2002).
5. 2 thin films," Thin Solid Films 396, 44-52 (2001).
6. 2-based ultraviolet narrow-bandpass filters prepared by plasma ion-assisted deposition," Appl. Opt. 46, 175-179 (2007).
7. J. N. Hilfiker, C. L. Bungay, R. A. Synowicki, T. E. Tiwald, C. M. Herzinger, B. John, G. K. Pribil, and J. A. Woollam, "Progress in spectroscopic ellipsometry: applications from vacuum ultraviolet to infrared," J. Vac. Sci. Tech. A 21, 1103-1108 (2003).
8. 2 DUV and VUV optical components by quasi-Brewster angle technique," Appl. Opt. 45, 5621-5628 (2006).
9. 3 thin film evaluated by variable angle spectroscopic ellipsometry," Appl. Opt. 46, 3221-3226 (2007).
10. M. F. Ogawa, Y. Natsume, T. Hirayama, and H. Sakata, "Optical absorption edge of zinc oxide films by CVD," J. Mater. Sci. Lett. 9, 1354-1356 (1990).