The influence of ion mass and energy on the composition of IBAD oxide films

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 297-302

  Rizzo, A ^a   Alvisi, M ^b   Sarto, F ^c   Scaglione, S ^c   Vasanelli, L ^b  

^a SS7 Appia Km 712   (Italy)

^b INFM   (Italy)

^c ENEA   (Italy)

Author keywords

Ion beam assistance; Oxide films; Sputtering yield; UV optical coatings

Indexed keywords

ARGON; HAFNIUM COMPOUNDS; ION BEAMS; ION BOMBARDMENT; LIGHT ABSORPTION; MATHEMATICAL MODELS; SILICA; SPUTTER DEPOSITION; ULTRAVIOLET RADIATION; XENON; ZIRCONIA;

HAFNIUM DIOXIDE; ION-BEAM ASSISTED DEPOSITION (IBAD); SIGMUND'S MODEL;

OPTICAL COATINGS;

EID: 0032184470     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00655-0     Document Type: Article

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