Effect of the internal stress relaxation during the post-annealing on the photo-induced properties of TiO2 coatings reactively sputtered

Surface and Coatings Technology

Volumn 202, Issue 24, 2008, Pages 6120-6126

  Aubry, E ^a,b   Demange, V ^a   Billard, A ^c  

^a INSTITUT JEAN LAMOUR   (France)

^b UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^c UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

Author keywords

Annealing; Hydrophilicity; Photocatalysis; Porous TiO2; Sputtering; Stress

Indexed keywords

PHOTOCATALYSIS;

HYDROPHILICITY; INTERNAL STRESS RELAXATION; PHOTO CATALYSTS; PHOTO-INDUCED; POROUS TIO2; POST-ANNEALING; SPUTTERING; STRESS;

ANNEALING;

EID: 50849099174     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.07.016     Document Type: Article

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