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Volumn 136, Issue 1-3, 2001, Pages 32-35

Development of plasma-based ion implantation (PBII) techniques at Osaka National Research Institute (ONRI)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC POTENTIAL; ION IMPLANTATION; PULSE GENERATORS; SURFACE TREATMENT;

CATHODIC ARC DEPOSITION; PLASMA-BASED ION IMPLANTATION (PBII);

PLASMA SOURCES;

EID: 0035254576 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(00)01005-7 Document Type: Article

Times cited : (5)

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