Evaluation of nanoscale roughness measurements on a plasma treated SU-8 polymer surface by atomic force microscopy

Applied Surface Science

Volumn 254, Issue 22, 2008, Pages 7290-7295

  Walther, Ferdinand ^a   Heckl, Wolfgang M ^a,b   Stark, Robert W ^a  

^a UNIVERSITY OF MUNICH   (Germany)

^b DEUTSCHES MUSEUM   (Germany)

Author keywords

AFM; Hydrophilisation; Intermittent contact; Photoresist; Plasma treatment; Polymer; SU 8; Tip degradation

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; PHOTORESISTS; PLASMA APPLICATIONS; POLYMERS; ROUGHNESS MEASUREMENT;

HYDROPHILISATION; INTERMITTENT-CONTACTS; PLASMA TREATMENT; SU-8; TIP DEGRADATION;

SURFACE ROUGHNESS;

EID: 50549102493     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.323     Document Type: Article

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