Intrinsic stress analysis of sputtered carbon film

Chinese Optics Letters

Volumn 6, Issue 5, 2008, Pages 384-385

  Liu, Liqin ^a   Wang, Zhanshan ^a   Zhu, Jingtao ^a   Zhang, Zhong ^a   Tan, Moyan ^a   Huang, Qiushi ^a   Chen, Rui ^a   Xu, Jing ^a   Chen, Lingyan ^a  

^a TONGJI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; INERT GASES; MAGNETRON SPUTTERING; STRESS RELIEF; SUBSTRATES;

INTRINSIC STRESSES;

CARBON FILMS;

EID: 50549087903     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL20080605.0384     Document Type: Article

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