B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

Chinese Optics Letters

Volumn 4, Issue 10, 2006, Pages 611-613

  Wang, Zhanshan ^a   Zhang, Shumin ^a   Wu, Wenjuan ^a   Zhu, Jingtao ^a   Wang, Hongchang ^a   Li, Cunxia ^a   Xu, Yao ^a   Wang, Fengli ^a   Zhang, Zhong ^a   Chen, Lingyan ^a   Zhou, Hongjun ^b   Huo, Tonglin ^b  

^a TONGJI UNIVERSITY   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; MULTILAYERS; REFLECTION; SYNCHROTRON RADIATION;

DIRECT CURRENT MAGNETRON SPUTTERING; HIGH REFLECTIVITY MULTILAYER MIRROR; NATIONAL SYNCHROTRON RADIATION LABORATORY (NSRL); SOLAR PHYSICS INSTRUMENTATION;

MIRRORS;

EID: 33845364342     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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