Chirally oriented heteroepitaxlal thin films grown by pulsed laser deposition: Pt(621) on SrTiO 3(621)

Journal of Applied Physics

Volumn 96, Issue 5, 2004, Pages 2482-2493

  Francis, Andrew J ^a   Salvador, Paul A ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHIRAL ORIENTATION; CHIRAL SURFACES; CRYSTALLINITY; HETEROEPITAXIAL THIN FILMS;

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; PLATINUM; PULSED LASER DEPOSITION; SINGLE CRYSTALS; STRONTIUM COMPOUNDS; TEMPERATURE PROGRAMMED DESORPTION; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 5044235924     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1768609     Document Type: Article

References (82)

1. C. F. McFadden, P. S. Cremer, and A. J. Gellman, Langmuir 12, 2483 (1996).
2. T. D. Power and D. S. Sholl, J. Vac. Sci. Technol. A 17, 1700 (1999).
3. D. S. Sholl, A. Asthagiri, and T. D. Power, J. Phys. Chem. B 105, 4771 (2001).
4. J. D. Horvath and A. J. Gellman, J. Am. Chem. Soc. 124, 2384 (2001).
5. J. D. Horvath and A. J. Gellman, J. Am. Chem. Soc. 123, 7953 (2001).
6. G. A. Attard, A. Ahmadi, J. Feliu, A. Rodes, E. Herrero, S. Blais, and G. Jerkiewicz, J. Phys. Chem. B 103, 1381 (1999).
7. G. A. Attard, J. Phys. Chem. B 105, 3158 (2001).
8. A. Ahmadi, G. Attard, J. Feliu, and A. Rodes, Langmuir 15, 2420 (1999).
9. R. M. Hazen and D. S. Sholl, Nat. Mater. 2, 367 (2003).
10. M. A. van Hove and G. A. Somorjai, Surf. Sci. 92, 489 (1980).
11. Herein we make a distinction between materials having a chiral orientation, where the sample is aligned such that chiral planes are perpendicular to the macroscopic surface normal, and materials having a chiral surface, where the sample is both chirally oriented and has a macroscopically flat surface with a chiral structure.
12. B. S. Kwak, P. N. First, A. Erbil, B. J. Wilkens, J. D. Budai, M. F. Chisholm, and L. A. Boatner, J. Appl. Phys. 72, 3735 (1992).
13. A. D. Polli, T. Wagner, T. Gemming, and M. Rüble, Surf. Sci. 448, 279 (2000).
14. T. Wagner, A. D. Polli, G. Richter, and H. Stanzick, Z. Metallkd. 92, 701 (2001).
15. G. R. Harp, R. F. C. Farrow, R. F. Marks, and J. E. Vazquez, J. Cryst. Growth 127, 627 (1993).
16. A. Asthagiri, C. Niederberger, A. J. Francis, L. M. Porter, P. A. Salvador, and D. S. Sholl, Surf. Sci. 537, 134 (2003).
17. G. B. Cho, Y. Kamada, and M. Yamamoto, Jpn. J. Appl. Phys., Part 1 40, 4666 (2001).
18. G. Koster, B. L. Kropman, G. J. H. M. Rjinders, D. H. A. Blank, and H. Rogalla, Appl. Phys. Lett. 73, 2920 (1998).
19. A. D. Polli, T. Wagner, and M. Rühle, Surf. Sci. 429, 237 (1999).
20. K. Szot and W. Speier, Phys. Rev. B 60, 5909 (1999).
21. M. Lippmaa, M. Kawasaki, A. Ohtomo, T. Sato, M. Iwatsuki, and H. Koinuma, Appl. Surf. Sci. 130-132, 582 (1998).
22. Q. D. Jiang and J. Zehenhagen, Mater. Res. Soc. Symp. Proc. 474, 373 (1997).
23. R. Sum, R. Lüthi, H. P. Lang, and H.-J. Güntherodt, Physica C 235-240, 621 (1994).
24. A. Gunhold, K. Gomann, L. Beuermann, M. Frerichs, G. Borchardt, V. Kempter, and W. Maus-Friedrichs, Surf. Sci. 507-510, 447 (2002).
25. N. Bickel, G. Schmidt, K. Heinz, and K. Muller, Vacuum 41, 46 (1990).
26. G. Koster, G. Rijnders, D. H. A. Blank, and H. Rogalla, Physica C 339, 215 (2000).
27. T.-D. Doan, J. L. Giocondi, G. S. Rohrer, and P. A. Salvador, J. Cryst. Growth 225, 178 (2001).
28. H. Bando, Y. Aiura, Y. Haruyama, T. Shimizu, and Y. Nishihara, J. Vac. Sci. Technol. B 13, 1150 (1995).
29. P. A. W. van der Heide, Q. D. Jiang, Y. S. Kim, and J. W. Rabalais, Surf. Sci. 473, 59 (2001).
30. Z.-Q, Li, J.-L. Zhu, C. Q. Wu, Z. Tang, and Y. Kawazoe, Phys. Rev. B 58, 8075 (1998).
31. B. Meyer, J. Padilla, and D. Vanderbilt, Faraday Discuss. 114, 395 (1999).
32. Y. Tanaka, H. Morishita, M. Watamori, K. Oura, and I. Katayama, Appl. Surf. Sci. 82/83, 528 (1994).
33. E. Heifets, R. I. Eglitis, E. A. Kotomin, J. Maier, and G. Borstel, Surf. Sci. 513, 211 (2002).
34. M. Kawasaki et al., Science 266, 1540 (1994).
35. T. Sano, D. M. Saylor, and G. S. Rohrer, J. Am. Ceram. Soc. 86, 1933 (2003).
36. P. C. McIntyre, C. J. Maggiore, and M. Nastasi, Acta Mater. 45, 869 (1997).
37. P. C. McIntyre, C. J. Maggiore, and M. Nastasi, J. Appl. Phys. 77, 6201 (1995).
38. J. F. M. Cillessen, R. M. Wolf, and D. M. D. Leeuw, Thin Solid Films 226, 53 (1993).
39. M. Morcrette, A. Gutierrez-Llorente, W. Seiler, J. Perrière, A. Laurent, and P. Barboux, J. Appl. Phys. 88, 5100 (2000).
40. J. Narayan, P. Tiwari, K. Jagannadham, and O. W. Holland, Appl. Phys. Lett. 64, 2093 (1993).
41. R. E. Leuchtner, D. B. Chrisey, J. S. Horwitz, and K. S. Grabowski, Surf. Coat. Technol. 51, 476 (1992).
42. K. H. Ahn, S. Baik, and S. S. Kim, J. Mater. Res. 17, 2334 (2002).
43. B. M. Lairson, M. R. Visokay, R. Sinclair, S. Hagstrom, and B. M. Clemens, Appl. Phys. Lett. 61, 1390 (1992).
44. J.L. Menéndez, P. Caro, and A. Cebollada, J. Cryst. Growth 192, 164 (1998).
45. C. Gatel, P. Baules, and E. Snoeck, J. Cryst. Growth 252, 424 (2003).
46. M. H. Kim, T.-S. Park, E. Yoon, D.-S. Lee, D.-Y. Park, H.-J. Woo, D.-I. Chun, and J. Ha, J. Mater. Res. 14, 1255 (1999).
47. D.-S. Lee, D.-Y. Park, M.-H. Kim, D.-I. Chun, J. Ha, and E. Yoon, Mater. Res. Soc. Symp. Proc. 441, 341 (1997).
48. T. J. Minvielle, R. L. White, M. L. Hildner, and R. J. Wilson, Surf. Sci. 366, L755 (1996).
49. M. Hecq and A. Hecq, J. Vac. Sci. Technol. 18, 219 (1980).
50. A. Nefedov, A. Abromeit, C. Morawe, and A. Stierle, J. Phys.: Condens. Matter 10, 717 (1998).
51. H. Tokura, B. Window, D. Neely, and M. Swain, Thin Solid Films 253, 344 (1994).
52. K. Zhao and H. K. Wong, J. Cryst. Growth 256, 283 (2003).
53. R. Vargas, T. Goto, W. Zhang, and T. Harai, Appl. Phys. Lett. 65, 1094 (1994).
54. J.-H. Kwon and S.-G. Yoon, Thin Solid Films 303, 136 (1997).
55. W. T. Petrie and J. M. Vohs, J. Chem. Phys. 101, 8098 (1994).
56. S. Roberts and R. J. Gorte, J. Phys. Chem. 95, 5600 (1991).
57. H.-P. Steinrueck, F. Pesty, L. Zhang, and T. E. Madey, Phys. Rev. B 51, 2427 (1995).
58. F. Pesty, H.-P. Steinrueck, and T. E. Madey, Surf. Sci. 339, 83 (1995).
59. H. Zhou, P. Wochner, A. Schöps, and T. Wagner, J. Cryst. Growth 234, 561 (2002).
60. T. Wagner, G. Richter, and M. Rühle, J. Appl. Phys. 89, 2606 (2001).
61. 3[012] points vertically. There are two situations where φ may differ from calculated values. (1) φ may be rotated 180° away depending on whether the goniometer tilts "forward" or "backward" in ψ space; (2) φ may be rotated 360-φ° away depending on whether the goniometer rotates clockwise or counterclockwise in φ space.
62. 3 peaks can be easily distinguished with our equipment.
63. H. E. Swanson, R. K. Fuyat, and G. M. Ugrinic, Standard X-ray Diffraction Powder Patterns (Nat. Bur. Stand. Circ., Washington DC, 1954), Vol. 539.
64. H. E. Swanson and E. Tatge, Standard X-ray Diffraction Powder Patterns (Nat. Bur. Stand. Circ.,Washington DC, 1953), Vol. 539.
65. J. C. Heyraud and J. J. Métois, Acta Metall. 28, 1789 (1980).
66. J. C. Heyraud and J. J. Métois, Surf. Sci. 128, 334 (1983).
67. M. McLean and B. Gale, Philos. Mag. 20, 1033 (1969).
68. W. M. Robertson and P. G. Shewmon, Trans. Metall. Soc. AIME 224, 804 (1962).
69. C. T. Campbell, Surf. Sci. Rep. 27, 1 (1997).
70. A. Asthagiri and D. S. Sholl, J. Chem. Phys. 116, 9914 (2002).
71. T. D. Power, A. Asthagiri, and D. S. Sholl, Langmuir 18, 3737 (2002).
72. A. Asthagiri, P. J. Feibelman, and D. S. Sholl, Top. Catal. 18, 193 (2002).
73. S. Wei, B. Li, T. Fujimoto, and I. Kojima, Phys. Rev, B 58, 3605 (1998).
74. F. Nguyen Van Dau, M. Sussiau, P. Galtier, A. Encinas, and A. Schuhl, J. Cryst. Growth 201-202, 723 (1999).
75. A. Encinas-Oropesa and F. Nguyen Van Dau, J. Magn. Magn. Mater. 256, 301 (2003).
76. N. Néel, T. Maroutian, L. Douillard, and H.-J. Ernst, Phys. Rev. Lett. 91, 226103 (2003).
77. G. Dennler, A. Houdayer, Y. Ségui, and M. R. Wertheimer, J. Vac. Sci. Technol. A 19, 2320 (2001).
78. E. Olsson, G. Brorsson, P. Å. Nilsson, and T. Claeson, Appl. Phys. Lett. 63, 1567 (1993).
79. L. E. Stillwagon, A. Kornbilt, and G. N. Taylor, J. Vac. Sci. Technol. B 6, 2229 (1988).
80. F. H. Kaatz, M. P. Siegal, W. R. Graham, J. van der Spiegel, and J. J. Santiago, Thin Solid Films 184, 325 (1990).
81. L. Ruan and D. M. Chen, Appl. Phys. Lett. 72, 3464 (1998).
82. R. T. Tung and J. L. Batstone, Appl. Phys. Lett. 52, 648 (1988).