Epitaxial growth of platinum thin films on various substrates by facing-target sputtering technique

Journal of Crystal Growth

Volumn 256, Issue 3-4, 2003, Pages 283-287

  Zhao, K ^a,b   Wong, H K ^b  

^a LIAOCHENG UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

A1. Atomic force microscopy; A1. Colossal magnetoresistance; A1. X ray diffraction; A3. Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; COLOSSAL MAGNETORESISTANCE; CRYSTAL ORIENTATION; ELECTROCHEMICAL ELECTRODES; MAGNESIUM COMPOUNDS; PLATINUM; SINGLE CRYSTALS; SPUTTERING; STRONTIUM COMPOUNDS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FACING-TARGET SPUTTERING TECHNIQUE;

EPITAXIAL GROWTH;

EID: 0043246627     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)01340-X     Document Type: Article

References (8)

1. Cillessen J.F.M., Wolf R.M., de Leeuw D.M. Thin Solid Films. 226:1993;53.
2. Cui G., van Buskirk P.C., Zhang J., Beetz C.P. Jr., Steinbeck J., Wang Z.L., Bentley J. Mater. Res. Soc. Symp. Proc. 310:1993;345.
3. Narajan J., Tiwari K., Jagannaadham K., Holland O.W. Appl. Phys. Lett. 64:1994;2093.
4. McIntyre P.C., Maggiore C.J., Nastasli M. J. Appl. Phys. 77:1995;6201.
5. Harp G.R., Parkin S.S.P. Thin Solid Films. 288:1996;315.
6. Zhao K., Zhou L.Z., Leung C.H., Yeung C.F., Fung C.K., Wong H.K. J. Crystal Growth. 237-239:2002;608.
7. Takai Y., Sato M. Supercond. Sci. Technol. 12:1999;486.
8. Fischer G., Hoffmann H., Vancea J. Phys. Rev. B. 22:1980;6065.