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Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 192-197

Profile control of large-area rectangular plasma in a modified-magnetron-type RF discharge

(5) Koshimizu, Takashi a,c Sato, Masanobu a Ogawa, Unryu a Iizuka, Satoru b Sato, Noriyoshi a

a HITACHI KOKUSAI ELECTRIC INC (Japan)

b TOHOKU UNIVERSITY (Japan)

c Yagi Memorial Telecommunication Systems Laboratory (Japan)

Author keywords

Chemical vapor deposition; Magnetron discharge; Plasma processing; Rectangular plasma; RF discharge

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC DISCHARGES; ELECTRODES; MAGNETRONS; PERMANENT MAGNETS; PLASMA DENSITY; SUBSTRATES;

RECTANGULAR PLASMAS;

PLASMA SOURCES;

EID: 0037155446 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00037-8 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.