Characterization of a high-frequency inductively coupled plasma source

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 469-473

  Lee, D S ^a   Jun, H S ^a   Chang, H Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

High frequency discharge; ICP; Parallel resonance antenna; Plasma source

Indexed keywords

ANTENNAS; CAPACITANCE; CHARACTERIZATION; DRY ETCHING; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; INDUCTANCE; PLASMA DENSITY;

HIGH FREQUENCY DISCHARGE; PARALLEL RESONANCE ANTENNA; PLASMA SOURCE; PLASMA UNIFORMITY;

INDUCTIVELY COUPLED PLASMA;

EID: 33645220614     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.057     Document Type: Conference Paper

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