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Volumn 16, Issue 9, 2008, Pages 1061-1065
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Intermetallic phase formation in nanometric Ni/Al multilayer thin films
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Author keywords
A. Nanostructured intermetallics; A. Nickel aluminides, based on Ni3Al; B. Phase transformation; C. Thin films; C. Vapour deposition
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Indexed keywords
ALUMINUM;
ALUMINUM CLADDING;
ANNEALING;
ARSENIC COMPOUNDS;
CHEMICAL ANALYSIS;
CHLORINE COMPOUNDS;
FILM PREPARATION;
INTERMETALLICS;
LIGHT METALS;
MAGNETRON SPUTTERING;
METALS;
MULTILAYERS;
NICKEL;
NICKEL ALLOYS;
PHASE INTERFACES;
SPUTTER DEPOSITION;
THICK FILMS;
A. NANOSTRUCTURED INTERMETALLICS;
A. NICKEL ALUMINIDES, BASED ON NI3AL;
AMORPHOUS PHASE;
AS-DEPOSITED FILMS;
ATOMIC COMPOSITIONS;
B. PHASE TRANSFORMATION;
C. THIN FILMS;
C. VAPOUR DEPOSITION;
CHEMICAL COMPOSITIONS;
DC-MAGNETRON SPUTTERING;
INTERMEDIATE PHASES;
INTERMETALLIC COMPOUNDS;
INTERMETALLIC-PHASE FORMATION;
MULTI LAYERING;
MULTI-LAYER THIN FILMS;
NANOMETRIC;
STRUCTURAL EVOLUTIONS;
MULTILAYER FILMS;
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EID: 50249182792
PISSN: 09669795
EISSN: None
Source Type: Journal
DOI: 10.1016/j.intermet.2008.06.002 Document Type: Article |
Times cited : (76)
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References (21)
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