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Volumn 16, Issue 9, 2008, Pages 1061-1065

Intermetallic phase formation in nanometric Ni/Al multilayer thin films

Author keywords

A. Nanostructured intermetallics; A. Nickel aluminides, based on Ni3Al; B. Phase transformation; C. Thin films; C. Vapour deposition

Indexed keywords

ALUMINUM; ALUMINUM CLADDING; ANNEALING; ARSENIC COMPOUNDS; CHEMICAL ANALYSIS; CHLORINE COMPOUNDS; FILM PREPARATION; INTERMETALLICS; LIGHT METALS; MAGNETRON SPUTTERING; METALS; MULTILAYERS; NICKEL; NICKEL ALLOYS; PHASE INTERFACES; SPUTTER DEPOSITION; THICK FILMS;

EID: 50249182792     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2008.06.002     Document Type: Article
Times cited : (76)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.