Reactive phase formation in sputter-deposited Ni/Al multilayer thin films

Journal of Materials Research

Volumn 12, Issue 1, 1997, Pages 133-146

  Barmak, K ^a   Michaelsen, C ^b   Lucadamo, G ^a  

^a Lehigh University   (United States)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRIC RESISTANCE MEASUREMENT; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; MULTILAYERS; NUCLEATION; PHASE TRANSITIONS; REACTION KINETICS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS PHASE; PHASE FORMATION; ZERO EFFECTIVE PERIODICITY;

NICKEL COMPOUNDS;

EID: 0030734191     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0021     Document Type: Article

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