Modeling of sensitivity of fabricated capacitive pressure sensor

IECON Proceedings (Industrial Electronics Conference)

Volumn , Issue , 2006, Pages 3166-3169

  Saleh, Sherif ^a   Zaki, Amal ^a   Elsemary, Hamed ^a   Ahmad, S ^b  

^a ELECTRONICS RESEARCH INSTITUTE   (Egypt)

^b CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DIAPHRAGMS; ELECTRIC CURRENTS; ELECTRONICS INDUSTRY; FISCHER-TROPSCH SYNTHESIS; GLASS; GLASS BONDING; INDUSTRIAL ELECTRONICS; METALS; MICROMACHINING; NONMETALS; OPTICAL DESIGN; PARTIAL PRESSURE SENSORS; PHOTORESISTS; PRESSURE SENSORS; PRESSURE TRANSDUCERS; SENSITIVITY ANALYSIS; SILICON; SILICON WAFERS; WAFER BONDING;

ANNUAL CONFERENCE; APPLIED PRESSURE; BULK MICRO-MACHINING; CAPACITIVE PRESSURE SENSORS; FULLY INTEGRATED; GLASS WAFERS; HERMETIC CHAMBERS; HIGH SENSITIVITIES; METAL ELECTRODES; SENSOR CAPACITANCES; SENSOR FABRICATION; SENSOR SENSITIVITIES; SILICON DIAPHRAGM; SIMULATION RESULTS;

SENSORS;

EID: 50249157572     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IECON.2006.347955     Document Type: Conference Paper

References (8)

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