Polymer thin film transistor without surface pretreatment on silicon nitride gate dielectric

Applied Physics Letters

Volumn 93, Issue 7, 2008, Pages

  Li, Flora M ^a   Dhagat, Parul ^b   Haverinen, Hanna M ^c   McCulloch, Iain ^d,f   Heeney, Martin ^d,g   Jabbour, Ghassan E ^b   Nathan, Arokia ^e  

^a UNIVERSITY OF WATERLOO   (Canada)

^b ARIZONA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF OULU   (Finland)

^d Merck Chemicals   (United Kingdom)

^e UNIVERSITY COLLEGE LONDON   (United Kingdom)

^f IMPERIAL COLLEGE LONDON   (United Kingdom)

^g QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; DIELECTRIC DEVICES; GATE DIELECTRICS; GATES (TRANSISTOR); NITRIDES; NONMETALS; OPTICAL DESIGN; ORGANIC POLYMERS; POLYMERS; SILICON; SILICON NITRIDE; THICK FILMS; THIN FILM DEVICES; THIN FILM TRANSISTORS; THIN FILMS; THIOPHENE; TRANSISTORS;

DEVICE LAYERS; DEVICE PERFORMANCES; DIELECTRIC SURFACES; EFFECTIVE MOBILITY; IN-FIELD; ORGANIC THIN FILM TRANSISTORS; POLYMER THIN FILMS; SILICON-NITRIDE GATE DIELECTRICS; SOLUTION PROCESSED POLYMERS; SURFACE MODIFICATIONS; SURFACE PRE TREATMENTS;

FIELD EFFECT TRANSISTORS;

EID: 50249098580     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2927485     Document Type: Article

References (21)

1. J. Veres, S. Ogier, and G. Lloyd, Chem. Mater. 16, 4543 (2004).
2. A. Salleo, M. L. Chabinyc, M. S. Yang, and R. A. Street, Appl. Phys. Lett. 81, 4383 (2002).
3. P. Liu, Y. Wu, Y. Li, B. S. Ong, and S. Zhu, J. Am. Chem. Soc. 128, 4554 (2006).
4. R. J. Kline, M. D. McGehee, and M. F. Toney, Nat. Mater. 5, 222 (2006).
5. V. Coropceanu and J. L. Bredas, Nat. Mater. 5, 929 (2006).
6. A. Facchetti, M.-H. Yoon, and T. J. Marks, Adv. Mater. (Weinheim, Ger.) 17, 1705 (2005).
7. L. A. Lucas, D. M. DeLongchamp, B. M. Vogel, E. K. Lin, M. J. Fasolka, D. A. Fischer, I. McCulloch, M. Heeney, and G. E. Jabbour, Appl. Phys. Lett. 90, 012112 (2007).
8. D. Stryakhilev, A. Sazonov, and A. Nathan, J. Vac. Sci. Technol. A 20, 1087 (2002).
9. S. Wagner, H. Gleskovaa, I. C. Chenga, and M. Wu, Thin Solid Films 430, 15 (2003).
10. C. McArthur, M. Meitine, and A. Sazonov, MRS Symposia Proceedings Vol. 769 (Materials Research Society, Pittsburgh, 2003), p. 303.
11. Y. Wu, P. Liu, B. S. Ong, T. Srikumar, N. Zhao, G. Botton, and S. Zhu, Appl. Phys. Lett. 86, 142102 (2005).
12. S. C. Lim, S. H. Kim, J. H. Lee, M. K. Kim, D. J. Kim, and T. Zyung, Synth. Met. 148, 75 (2005).
13. R. J. Kline, D. M. DeLongchamp, D. A. Fischer, E. K. Lin, M. Heeney, I. McCulloch, and M. F. Toney, Appl. Phys. Lett. 90, 062117 (2007).
14. F. M. Li, A. Nathan, Y. Wu, and B. S. Ong, Appl. Phys. Lett. 90, 133514 (2007).
15. W. Y. Chou, C. W. Kuo, H. L. Cheng, Y. R. Chen, F. C. Tang, F. Y. Yang, D. Y. Shu, and C. C. Liao, Appl. Phys. Lett. 89, 112126 (2006).
16. H. W. Zan, K. H. Yen, P. K. Liu, K. H. Ku, C. H. Chen, and J. Hwang, Org. Electron. 8, 450 (2007).
17. M. L. Chabinyc, R. Lujan, F. Endicott, M. F. Toney, I. McCulloch, and M. Heeney, Appl. Phys. Lett. 90, 233508 (2007).
18. C. Song, B. Koo, S. Lee, and D. Kim, J. Appl. Phys. 41, 2730 (2002).
19. L. L. Kosbar, C. D. Dimitrakopoulos, and D. J. Mascaro, MRS Symposia Proceedings Vol. 665 (Materials Research Society, Pittsburgh, 2001), p. C10.6.1.
20. M. Lee and C. Song, Jpn. J. Appl. Phys., Part 1 42, 4218 (2003).
21. A. L. Briseno, S. C. B. Mannsfeld, M. M. Ling, S. Liu, R. J. Tseng, C. Reese, M. E. Roberts, Y. Yang, F. Wudl, and Z. Bao, Nature (London) 444, 913 (2006).