Soft X-ray lithography of high aspect ratio SU8 submicron structures

Microsystem Technologies

Volumn 14, Issue 9-11, 2008, Pages 1683-1688

  Reznikova, Elena ^a   Mohr, Juergen ^a   Boerner, Martin ^a   Nazmov, Vladimir ^a   Jakobs, Peter Juergen ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; LITHOGRAPHY; OPTICAL DESIGN; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; PRESSURE DROP; X RAY LITHOGRAPHY;

ABSORBED POWER; BEAM LINES; DEFECT-FREE; HIGH ASPECT RATIO; LATERAL DIMENSIONS; LOW PRESSURE; LOW TEMPERATURE; MODIFIED SPECTRA; NARROW BANDS; OPTIMIZED PROCESS; POST EXPOSURE BAKING; SOFT X-RAY; STRUCTURAL SIZES; SU-8 RESISTS; SUBMICRON STRUCTURING; TEMPERATURE CHANGING; X-RAY SPECTRUM;

ASPECT RATIO;

CHROMIUM; DIFFRACTION; ELECTRON SPECTROSCOPY; LITHOGRAPHY; PHOTOELECTRONS; PRESSURE GRADIENT; SHRINKAGE; X RAY SPECTROSCOPY;

EID: 49949111063     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0507-x     Document Type: Conference Paper

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