Microelectroplating silver on sharp edges toward the fabrication of solid-state nanopores

Journal of the Electrochemical Society

Volumn 151, Issue 9, 2004, Pages

  Polk, Brian J ^a   Bernard, Melanie ^a   Kasianowicz, John J ^b   Misakian, Martin ^b   Gaitan, Michael ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Physical and Chemical Properties Division   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; ELECTRODES; ETCHING; MASS TRANSPORTATION; MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER PLATING; SUBSTRATES;

MICROELECTROPLATING; MICROFLUIDS; NANOPORES; OPEN CIRCUIT POTENTIAL (OCP);

ELECTROPLATING;

EID: 4944242229     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1773732     Document Type: Article

References (26)

1. R. Schuster, V. Kirchner, P. Allongue, and G. Ertl, Science, 289, 98 (2000).
2. T. P. Moffat, J. E. Bonevich, W. H. Huber, A. Stanishevsky, D. R. Kelly, G. R. Stafford, and D. Josell, J. Electrochem. Soc., 147, 4524 (2000).
3. E. W. Becker, W. Ehrfeld, P. Hagman, A. Maner, and D. Munchmeyer, Microelectron. Eng., 4, 35 (1986).
4. B. C. Baker, M. Freeman, B. Melnick, D. Wheeler, D. Josell, and T. P. Moffat, J. Electrochem. Soc., 150, C61 (2003).
5. M. Nishizawa, V. P. Menon, and C. R. Martin, Science. 268, 700 (1995).
6. J. J. Kasianowicz, S. E. Henrickson, H. H. Weetall, and B. Robertson, Anal. Chem., 73, 2268 (2001).
7. J. J. Kasianowicz, E. Brandin, D. Branton, and D. W. Deamer, Proc. Natl. Acad. Sci. U.S.A., 93, 13770 (1996).
8. J. Li, D. Stain, C. McMullan, D. Branton, M. J. Aziz, and J. A. Golovchenko, Nature (London), 412, 166 (2001).
9. O. A. Salen and L. L. Sohn, Nano Lett., 3, 37 (2003).
10. D. Josell, B. Baker, C. Witt, D. Wheeler, and T. P. Moffat, J. Electrochem. Soc., 149, C637 (2002).
11. D. Wheeler, D. Josell, and T. P. Moffat, J. Electrochem. Soc., 150, C302 (2003).
12. Modern Electroplating, 3rd ed., F. A. Lowenheim, Editor, Chap. 14, 28, and 31, John Wiley & Sons, New York (1974).
13. V. P. Menon and C. R. Martin, Anal. Chem., 67, 1920 (1995).
14. Physical Electrochemistry: Principles, Methods, and Applications, I. Rubinstein, Editor, Marcel Dekker, Inc., New York (1995).
15. R. M. Stiger, S. Gorer, B. Craft, and R. M. Penner, Langmuir, 15, 790 (1999).
16. D. G. Foster, Y. Shapir, and J. Jorne, J. Electrochem. Soc., 150, c375 (2003).
17. K. Marquez, F. Staikov, and J. W. Schultze, Electrochim. Acta, 48, 875 (2003).
18. A. N. Correia, M. C. dos Santos, S. A. S. Machado, and L. A. Avaca, J. Electroanal. Chem., 547, 53 (2003).
19. N. H. Tea, V. Milanovic, C. A. Zincke, J. S. Suehle, M. Gaitan, M. E. Zaghloul, and J. J. Geist, J. Microelectromech. Syst., 6, 363 (1997).
20. User's Manual, 2400 Series SourceMeter, Keithley Instruments, Cleveland, OH (1998).
21. User Guide, 1287 Electrochemical Interface, Solartron Analytical, Farnborough, Hampshire, England (2002).
22. J. Wang, Analytical Electrochemistry, pp. 20-23, VCH Publishers, Inc., New York (1994).
23. A. J. Bard and L. R. Faulkner, Electrochemical Methods, Fundamentals and Applications, 2nd ed., pp. 537-541, John Wiley & Sons, New York (2001).
24. Y. Lee, S. Amemiya, and A. J. Bard, Anal. Chem., 73, 2261 (2001).
25. J. D. Madden and I. W. Hunter, J. Micromech. Microeng., 5, 24 (1996).
26. A. Jansson, G. Thornell, and S. Johansson, J. Electrochem. Soc., 147, 1810 (2000).