High resolution 3D microstructures made by localized electrodeposition of nickel

Journal of the Electrochemical Society

Volumn 147, Issue 5, 2000, Pages 1810-1817

  Jansson, Anders ^a   Thornell, Greger ^a   Johansson, Stefan ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VARIABLES CONTROL; ELECTROCHEMICAL ELECTRODES; GROWTH (MATERIALS); METALLOGRAPHIC MICROSTRUCTURE; NICKEL; NICKEL PLATING; SURFACE STRUCTURE;

AMMONIUM FORMATE; NICKEL PLATING SOLUTIONS; PLATING BATH; SURFACE SMOOTHNESS;

ELECTROPLATING;

EID: 0033738707     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393439     Document Type: Article

References (24)

1. G. Thornell and S. Johansson, J. Micromech. Microeng., 8, 251 (1998).
2. M. A. McCord, D. P. Kern, and T. H. P. Chang, J. Vac. Sci. Technol., B6, 1877 (1988).
3. T. M. Bloomstein and D. J. Ehrlich, in Proceedings of Transducers, San Fransisco, CA, pp. 597-511 (1991).
4. K. Williams, J. Maxwell, K. Larsson, and M. Boman, in Proceedings of MEMS '99, IEEE, Orlando, FL. pp. 232-237(1999).
5. O. E. Hüsser, D. H. Craston, and A. J. Bard, J. Electrochem. Soc. 136, 3222 (1989).
6. J. D. Madden and I. W. Hunter, J. Microelectromech. Systems, 5(1), 24 (1996).
7. E. M. El-Giar and D. J. Thomson, WESCANEX '97 Proceedings, Conference on Communications, Power and Computing, IEEE, pp. 327-332 (1997).
8. L. J. J. Janssen, Electrochim. Acta, 34, 161 (1989).
9. R. K. Wangsness, Electromagnetic Fields, 2nd ed., John Wiley & Sons, Inc., New York (1986).
10. B. E. Conway, J. O'M. Bockris, E. Yeager, S. U. M. Khan, and K. E. White, Comprehensive Treatise of Electrochemistry, Vol. 7, Plenum Press, New York (1983).
11. E. Gileadi, E. Kirowa-Eisner, and J. Penciner, Interfacial Electrochemistry-An Experimental Approach, Addison-Wesley Publishing Company, Inc., England (1975).
12. J.-C. Bradley, J. Crawford, M. McGee, and S. G. Stephens, J. Electrochem. Soc., 145, L45 (1998).
13. P. Garik, D. Barkey, E. Ben-Jacob, E. Bochner, N. Broxholm, B. Miller, B. Orr, and R. Zamir, Phys. Rev. Lett., 62, 2703 (1989).
14. R. F. Bunshah, Handbook of Deposition Technologies for Films and Coatings, Science Technology and Applications, 2nd ed., Noyes Publications, Park Ridge, NJ (1994).
15. Gmelins Handbuch der Anorganischen Chemie. 8th ed., 57 AII, Verlag Chemie, GmbH, Germany (1968).
16. H. Zhang and S.-M. Park, J. Appl. Electrochem., 24, 1182 (1994).
17. A. J. Bard and L. R. Faulkner, Electrochemical Methods-Fundamentals and Applications, John Wiley & Sons, Inc., Neu York (1980); J. M. Davies, F.-R. F. Fan, and A. J. Bard, J. Electroanal. Chem., 238, 9 (1987); and M. I. Montenegro, M. A. Queirós, and J. L. Daschbach, Microelectrodes: Theory and Application, (NATO ASI Series, E197), Kluwer Academic Publishers, Netherlands (1991).
18. A. J. Bard and L. R. Faulkner, Electrochemical Methods-Fundamentals and Applications, John Wiley & Sons, Inc., Neu York (1980); J. M. Davies, F.-R. F. Fan, and A. J. Bard, J. Electroanal. Chem., 238, 9 (1987); and M. I. Montenegro, M. A. Queirós, and J. L. Daschbach, Microelectrodes: Theory and Application, (NATO ASI Series, E197), Kluwer Academic Publishers, Netherlands (1991).
19. A. J. Bard and L. R. Faulkner, Electrochemical Methods-Fundamentals and Applications, John Wiley & Sons, Inc., Neu York (1980); J. M. Davies, F.-R. F. Fan, and A. J. Bard, J. Electroanal. Chem., 238, 9 (1987); and M. I. Montenegro, M. A. Queirós, and J. L. Daschbach, Microelectrodes: Theory and Application, (NATO ASI Series, E197), Kluwer Academic Publishers, Netherlands (1991).
20. K. B. Oldham, J. Electroanal. Chem., 250, 1 (1988).
21. J. Morales, S. Krijer, P. Esparza, S. González, L. Vàsquez, R. C. Salvarezza, and A. J. Arvia, Langmuir, 12, 1068 (1996).
22. C. K. Mann and K. K. Barnes, Electrochemical Reactions in Nonaqueous Systems, Marcel Dekker, Inc., New York (1971).
23. J. O'M. Bockris, Modern Electrochemistry-An Introduction to an Interdisciplinary Area, Vol. 2, Plenum Press, New York (1970).
24. A. J. Bard, F.-R. F. Fan, J. Kwak, and O. Lev. Anal. Chem., 61, 132 (1989).