Investigation of the ability of a silica "seed" layer to improve the thermal and aqueous immersion stability of alkylsilane monolayers on silicon oxide surfaces

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7538-7546

  Anderson, A ^a   Ashurst, W R ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

Monolayer stability

Indexed keywords

AGRICULTURAL PRODUCTS; ALUMINA; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ELECTRON ENERGY LEVELS; ELLIPSOMETRY; IMAGING TECHNIQUES; LIGHT METALS; MICROSCOPIC EXAMINATION; MONOLAYERS; NITRIDES; NONMETALS; OXIDE FILMS; SCANNING PROBE MICROSCOPY; SEED; SILANES; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

ALKYLSILANE; ALKYLSILANE MONOLAYERS; ALUMINUM SUBSTRATES; CONTACT ANGLES; ELEVATED TEMPERATURES; ELLIPSOMETRIC DATA; FILM STABILITY; MOLECULAR FILMS; MONOLAYER STABILITY; NATIVE STATES; ORGANOSILANE; SEED LAYERS; SILICON OXIDE SURFACES; SURFACE MODIFICATIONS;

SURFACE REACTIONS;

EID: 49349104054     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.103     Document Type: Article

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