Ordering of PS-b-P4VP on patterned silicon surfaces

ACS Nano

Volumn 2, Issue 7, 2008, Pages 1363-1370

  Park, Soojin ^a   Kim, Bokyung ^a   Yavuzcetin, Ozgur ^a   Tuominen, Mark T ^a   Russell, Thomas P ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Block copolymer micelle; Grating surface; Long range order; Moir analysis; PS b P4VP

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; COLLOIDS; COPOLYMERIZATION; MICELLES; NONMETALS; PLASTIC PRODUCTS; SILICON; STYRENE;

4-VINYL PYRIDINE; BLOCK COPOLYMER MICELLE; DIFFERENT SIZES; GRATING PATTERNS; GRATING SURFACE; HEXAGONAL ARRAYS; HIGH-QUALITY; LONG RANGE ORDERS; LONG-RANGE ORDER; ON-PATTERNED-SILICON; PS-B-P4VP; ROW SPACING; SOLVENT ANNEALING;

POLYMERS;

NANOMATERIAL; POLYSTYRENE BLOCK POLY(4 VINYLPYRIDINE); POLYSTYRENE DERIVATIVE; POLYSTYRENE-BLOCK-POLY(4-VINYLPYRIDINE); POLYVINYL DERIVATIVE; PYRIDINE DERIVATIVE; SILICON;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POLYSTYRENES; POLYVINYLS; PYRIDINES; SILICON; SURFACE PROPERTIES;

EID: 49249124013     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn800073f     Document Type: Article

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