Polymer thin films on patterned Si surfaces

Macromolecules

Volumn 31, Issue 6, 1998, Pages 1915-1920

  Li, Z ^a,b   Tolan, M ^c   Hohr T ^a   Kharas, D ^a   Qu, S ^a   Sokolov, J ^a   Rafailovich, M H ^a   Lorenz, H ^d   Kotthaus, J P ^d   Wang, J ^e   Sinha, S K ^e   Gibaud, A ^f  

^a Stony Brook   (United States)

^b EXXONMOBIL UPSTREAM RESEARCH COMPANY   (United States)

^c UNIVERSITY OF KIEL   (Germany)

^d UNIVERSITY OF MUNICH   (Germany)

^e ARGONNE NATIONAL LABORATORY   (United States)

^f UNIVERSITÉ DU MAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; THIN FILMS; X RAY ANALYSIS;

POLYMER THIN FILMS; SYNCHROTRON X RAY REFLECTION;

PLASTIC FILMS;

EID: 0032028249     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma970977x     Document Type: Article

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