Plasma-enhanced atomic layer deposition of SrTa2O6 thin films using Sr[Ta(OC2H5)5(OC 2H4OCH3)]2 as precursor

Journal of the Electrochemical Society

Volumn 151, Issue 5, 2004, Pages

  Shin, Woong Chul ^a   Ryu, Sang Ouk ^a   You, In Kyu ^a   Yu, Byoung Gon ^a   Lee, Won Jae ^b   Choi, Kyu Jeong ^c   Yoon, Soon Gil ^c  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Dong Eui University   (South Korea)

^c Chungnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; COMPOSITION; DEPOSITION; ELECTRIC PROPERTIES; FATIGUE TESTING; FERROELECTRIC MATERIALS; MOS DEVICES; PERMITTIVITY; STRONTIUM COMPOUNDS; THERMAL EFFECTS; THERMODYNAMIC STABILITY;

ATOMIC LAYER DEPOSITION; BI-LAYERED STRUCTURES; PRECURSORS;

THIN FILMS;

EID: 2942618410     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1668906     Document Type: Article

References (15)

1. W. J. Lee, I. K. You, S. O. Ryu, B. G. Yu, K. I. Cho, S. G. Yoon, and C. S. Lee, Jpn. J. Appl. Phys., Part 1, 40, 6941 (2001).
2. B. G. Chae, W. J. Lee, I. K. You, S. O. Ryu, M. Y. Jung, and B. G. Yu, Jpn. J. Appl. Phys., Part 2, 41, L729 (2002).
3. D. O. Lee, P. Roman, C.-T. Wu, P. Mumbauer, M. Brubaker, R. Grant, and J. Ruzyllo, Solid-State Electron., 46, 1671 (2002).
4. C. A. Paz de Araujo, L. D. Mcmiian, J. D. Cuchiaro, M. C. Scott, and J. F. Scott, Nature (London), 374, 627 (1995).
5. S. B. Desu and T. Li, Mater. Sci. Eng., B, B34, L4 (1995).
6. N. J. Seong, S. G. Yoon, and S. S. Lee, Appl. Phys. Lett., 71, 81 (1997).
7. W. C. Shin, K. J. Choi, and S. G. Yoon, J. Mater. Res., 17, 26 (2002).
8. E. Tokumitsu, G. Fujii, and H. Ishiwara, Appl. Phys. Lett., 75, 575 (1999).
9. M. Crosbie, P. Wright, H. Davies, A. Jones, T. Leedham, P. O'Brien, and G. Critchlow, Chem. Vap. Deposition, 5, 9 (1999).
10. H. Kadokura, Y. Okuhara, M. Mitsuya, and H. Funakubo, Chem. Vap. Deposition, 6, 225 (2000).
11. W. C. Shin, K. J. Choi, N. J. Seong, E. S. Choi, B. H. Kim, and S. G. Yoon, Chem. Vap. Deposition, 8, 221 (2002).
12. W. C. Shin and S. G. Yoon, J. Electrochem. Soc., 148, C762 (2001).
13. S. J. Won, Y. K. Jeong, D. J. Kwon, M. H. Park, H. K. Kang, K. P. Suh, H. K. Kim, J. H. Ka, K. Y. Yun, D. H. Lee, D. Y. Kim, Y. M. Yoo, and C. S. Lee, VLSI Tech. Dig., 2003, 23.
14. M. A. Herman, Appl. Surf. Sci., 112, 1 (1997).
15. D. C. Bradley, Chem. Rev. (Washington, D.C.), 89, 1317 (1989).