Morphology and growth process of carbon films prepared by microwave/radio frequency plasma assisted CVD

Advanced Engineering Materials

Volumn 10, Issue 7, 2008, Pages 651-656

  Kaczorowski, Witold ^a   Niedzielski, Piotr ^a  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; GAS MIXTURES; IMAGING TECHNIQUES; LIGHT EMISSION; MICROSCOPIC EXAMINATION; MOLECULAR BEAM EPITAXY; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SCANNING PROBE MICROSCOPY; SECONDARY EMISSION;

CARBON COATINGS; DEPOSITED FILMS; DEPOSITED LAYERS; DUAL-FREQUENCY; GRAIN SIZES; GROWTH PROCESSES; LIGHT SPECTRUM; NANO STRUCTURING; OPTICAL EMISSION SPECTROMETERS; OPTICAL EMISSION SPECTRUM; PLASMA PARAMETERS; RADIO FREQUENCY PLASMA REACTORS; SCANNING ELECTRON MICROSCOPY (SEM); SEM IMAGING;

CARBON FILMS;

EID: 49249083722     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200800052     Document Type: Conference Paper

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