Synthesis of thick, uniform, smooth ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition

Diamond and Related Materials

Volumn 15, Issue 2-3, 2006, Pages 341-344

  Huang, W S ^a   Tran, D T ^a   Asmussen, J ^a,b   Grotjohn, T A ^a   Reinhard, D ^a  

^a Michigan State University   (United States)

^b MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

Diamond deposition; Film thickness uniformity and smoothness; Microwave plasma CVD; Ultrananocrystalline diamond films

Indexed keywords

MICROWAVES; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL);

DIAMOND DEPOSITION; FILM THICKNESS UNIFORMITY AND SMOOTHNESS; MICROWAVE PLASMA CVD;

DIAMOND FILMS;

EID: 33644894189     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.09.027     Document Type: Article

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