-
1
-
-
0037397570
-
Wide-bandgap semiconductor ultraviolet photodetectors
-
E. Monroy, F. Omnes, and F. Calle, "Wide-bandgap semiconductor ultraviolet photodetectors," Semicond. Sci. Technol. 18, R33-R51 (2003),
-
(2003)
Semicond. Sci. Technol
, vol.18
-
-
Monroy, E.1
Omnes, F.2
Calle, F.3
-
2
-
-
0032620953
-
AlGaN metal-semiconductor-metal photodiodes
-
E. Monroy, F. Calle, F. Munoz, and F. Omnes, "AlGaN metal-semiconductor-metal photodiodes," Appl. Phys. Lett. 74, 3401-3403 (1999).
-
(1999)
Appl. Phys. Lett
, vol.74
, pp. 3401-3403
-
-
Monroy, E.1
Calle, F.2
Munoz, F.3
Omnes, F.4
-
3
-
-
0001044226
-
Comprehensive characterization of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN
-
J. C. Carrano, T. Li, P. A. Grudovsky, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, "Comprehensive characterization of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN," J. Appl. Phys. 83, 6148-6160 (1998)
-
(1998)
J. Appl. Phys
, vol.83
, pp. 6148-6160
-
-
Carrano, J.C.1
Li, T.2
Grudovsky, P.A.3
Eiting, C.J.4
Dupuis, R.D.5
Campbell, J.C.6
-
4
-
-
79956034209
-
High-responsivity submicron metal-semiconductor-metal ultraviolet detectors
-
T. Palacios, E. Monroy, F. Calle, and F. Omnes, "High-responsivity submicron metal-semiconductor-metal ultraviolet detectors," Appl. Phys. Lett. 81, 1902-1904 (2002).
-
(2002)
Appl. Phys. Lett
, vol.81
, pp. 1902-1904
-
-
Palacios, T.1
Monroy, E.2
Calle, F.3
Omnes, F.4
-
5
-
-
0036026379
-
Submicron technology for III-nitride semiconductors
-
T. Palacios, F. Calle, E. Monroy, and F. Munoz, "Submicron technology for III-nitride semiconductors," J. Vac. Sci. Technol. B 20, 2071-2074 (2002).
-
(2002)
J. Vac. Sci. Technol. B
, vol.20
, pp. 2071-2074
-
-
Palacios, T.1
Calle, F.2
Monroy, E.3
Munoz, F.4
-
6
-
-
35348850789
-
Gallium nitride metal-semiconductor-metal photodetectors prepared on silicon substrates
-
R. W. Chuang, S. P. Chuang, and S. J. Chuang, "Gallium nitride metal-semiconductor-metal photodetectors prepared on silicon substrates," J. Appl. Phys. 102, 073110 (2007)
-
(2007)
J. Appl. Phys
, vol.102
, pp. 073110
-
-
Chuang, R.W.1
Chuang, S.P.2
Chuang, S.J.3
-
7
-
-
0348146371
-
GaN-based epitaxy on silicon: Stress measurements
-
A. Krost, A. Dadgar, G. Strassburger, and R. Clos, "GaN-based epitaxy on silicon: stress measurements," Phys. Status Solidi A 200, 26-35 (2003).
-
(2003)
Phys. Status Solidi A
, vol.200
, pp. 26-35
-
-
Krost, A.1
Dadgar, A.2
Strassburger, G.3
Clos, R.4
-
8
-
-
33845202791
-
GaN micromachined FBAR structures for microwave applications
-
A. Müller, D. Neculoiu, D. Vasilache, D. Dascalu, G. Konstantinidis, A. Kosopoulos, A. Adikimenakis, A. Georgakilas, K. Mutamba, C. Sydlo, H. L. Hartnagel, and A. Dadgar, "GaN micromachined FBAR structures for microwave applications," Superlattices Microstruct. 40, 426-431 (2006).
-
(2006)
Superlattices Microstruct
, vol.40
, pp. 426-431
-
-
Müller, A.1
Neculoiu, D.2
Vasilache, D.3
Dascalu, D.4
Konstantinidis, G.5
Kosopoulos, A.6
Adikimenakis, A.7
Georgakilas, A.8
Mutamba, K.9
Sydlo, C.10
Hartnagel, H.L.11
Dadgar, A.12
-
9
-
-
0037449332
-
Backilluminated GaN/AlGaN heterojunction ultraviolet photodetector with high internal gain
-
S. K. Zhang, W. B. Wang, I. Shatu, F. Yun, L. He, H. Markoç, X. Zhou, M. Tamargo, and R. R. Aifano, "Backilluminated GaN/AlGaN heterojunction ultraviolet photodetector with high internal gain," Appl. Phys. Lett. 81, 4862-4864 (2002).
-
(2002)
Appl. Phys. Lett
, vol.81
, pp. 4862-4864
-
-
Zhang, S.K.1
Wang, W.B.2
Shatu, I.3
Yun, F.4
He, L.5
Markoç, H.6
Zhou, X.7
Tamargo, M.8
Aifano, R.R.9
|