Optical band gap of nitrogenated amorphous carbon thin films synthesized by microwave surface wave plasma CVD

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1666-1668

  Adhikari, Sudip ^a   Aryal, Hare Ram ^a   Ghimire, Dilip Chandra ^a   Kalita, Golap ^a   Umeno, Masayoshi ^a  

^a CHUBU UNIVERSITY   (Japan)

Author keywords

a C film; Carbon source gas; Nitrogen; Optical band gap; Surface wave plasma

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; ENERGY GAP; FLUID DYNAMICS; FLUID MECHANICS; GALLIUM ALLOYS; MICROWAVES; NONMETALS; OXIDE MINERALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SURFACE WAVES; THICK FILMS; THIN FILMS; WATER WAVES; WAVES;

A-C FILM; AMORPHOUS CARBON THIN FILMS; CARBON SOURCE GAS; MICROWAVE SURFACE; MICROWAVE SURFACE WAVE PLASMA CHEMICAL VAPOR DEPOSITION; NITROGEN; OPTICAL BAND GAP; OPTICAL BAND GAPS; QUARTZ SUBSTRATES; SURFACE WAVE PLASMA;

AMORPHOUS FILMS;

EID: 48849102265     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.03.027     Document Type: Article

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