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Volumn 104, Issue 2, 2008, Pages

Measurement of the redistribution of arsenic at nickel silicide/silicon interface by secondary ion mass spectrometry: Artifact and optimized analysis conditions

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; DOPING (ADDITIVES); IONS; NICKEL; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SILICIDES; SOLID STATE REACTIONS;

EID: 48849096575     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2959643     Document Type: Article
Times cited : (11)

References (20)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.